Optical Proximity Correction (OPC) Software Market Share Driven by Advanced Node Scaling and Next-Generation Lithography Requirements | Valuates Reports

Optical Proximity Correction (OPC) Software Market
The global Optical Proximity Correction (OPC) Software market was valued at US$ million in 2023 and is anticipated to reach US$ million by 2030, witnessing a CAGR of % during the forecast period 2024-2030.

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The Optical Proximity Correction (OPC) Software Market is experiencing strong momentum as semiconductor manufacturers advance toward smaller nodes and increasingly complex chip architectures. Market size expansion is driven by market trends such as rising lithography precision requirements, tighter design rules, and the widespread adoption of computational lithography across global fabs. As device scaling intensifies, OPC software plays an essential role in correcting distortions during the photolithography process, supporting consistent pattern fidelity and powering overall market growth.

Rule-based OPC currently holds the largest market share due to its established integration in mature nodes and high-volume production environments where predictable correction patterns support efficient mask generation. Model-based OPC is expanding at a faster pace as advanced semiconductor processes demand physics-driven modeling, simulation accuracy, and enhanced capability to manage intricate geometries. Both type categories remain critical for fabs optimizing throughput and ensuring reliable pattern transfer.

In terms of application, logic and MPU lead the market as manufacturers push continuous enhancements in computational performance, transistor density, and chip complexity. The memory segment also contributes significantly, driven by growing demand for DRAM, NAND, and emerging memory technologies that require accurate photomask optimization. Other applications maintain steady growth as diverse semiconductor verticals adopt OPC tools to enhance yield and reduce process variability.

Leading companies including ASML, KLA, Siemens, Synopsys, Fraunhofer IISB, Moyan Computational Science, and Wuhan Yuwei Optical Software reinforce market share through differentiated computational engines, software optimization, robust simulation workflows, and alignment with global semiconductor manufacturing ecosystems. Their focus on algorithmic innovation, multi-patterning support, and integration with fab automation systems allows them to stay competitive in a high-precision environment.

Regionally, North America, Europe, and Asia-Pacific remain key production hubs for OPC software development and deployment, supported by strong semiconductor R&D ecosystems and extensive fabrication infrastructure. Consumption is highest across Asia-Pacific, particularly in China, Japan, South Korea, and Taiwan, where memory and logic production capacity continues to expand. North America and Europe maintain strong adoption driven by advanced node development and design tool innovation. The market forecast indicates sustained market growth supported by next-generation lithography, computational advancements, continued fab expansion, and the global push toward higher-performance semiconductor devices.

Segment by Type

• Rule-Based
• Model-Based

Segment by Application

• Memory
• Logic/MPU
• Others

By Company

ASML, KLA, Siemens, Synopsys, Fraunhofer IISB, Moyan Computational Science, Wuhan Yuwei Optical Software

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