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Press Releases from Stanford Advanced Materials (1 total)

What is High-Power Pulsed Magnetron Sputtering (HPPMS)?

Magnetron sputtering technology is widely used in the field of thin film preparation. However, the conventional magnetron sputtering technology has a relatively low metal ionization rate. In order to increase the ionization rate of metal particles, several physical vapor deposition techniques have been developed in recent decades, including inductively coupled plasma magnetron sputtering (ICP-MS), electron cyclotron resonance magnetron sputtering (ECR-MS), hollow Cathodic magnetron sputtering (HCMS), self-sustained magnetron sputtering (SSS) and

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