Press release
Hydrofluoroether Cleaners: The Safer, High-Performance Alternative to Legacy Solvents
Compared with legacy solvents that pose flammability, corrosion, and worker-exposure risks, HFE formulations offer chemically stable, low-surface-tension cleaning performance suitable for vapor-degreasing, immersion cleaning, and precision wiping applications. This enables manufacturers to reduce safety incidents, extend equipment life, comply with environmental regulations, and maintain consistent cleaning quality across demanding production environments.The above case demonstrates how Hydrofluoroether Cleaners help high-tech industries achieve safer, more reliable, and environmentally compliant cleaning performance. QY Research has recently published a detailed industry report on this specialized chemical segment. Below are the key contents of the study.
https://www.qyresearch.com/reports/5536493/hydrofluoroether-cleaner
Core Market Data
Global market size: USD 1.7 billion
CAGR (2024-2030): 5.9%
Average price: USD 44000 per ton
Annual production: 38.5 kilotons
Gross margin: 34%
Production capacity: 46 kilotons
List of Main Players
3M Company (USA)
Chemours (USA)
DuPont (USA)
Solvay (Belgium)
Daikin (Japan)
AGC Chemicals (Japan)
Koura Global (Mexico)
Gujarat Fluorochemicals (India)
Haohua Chemical (China)
Zhejiang Juhua (China)
Dongyue Group (China)
Shenzhen Capchem (China)
Sicong Chemical (China)
Huafu Fluoro-Chemical (China)
1. By Product Type
HFE-7100 (C4F9OCH3)
HFE-7200 (C4F9OC2H5)
HFE-7500 (C3F7OCH3)
2. By Application Process
Vapor Degreasing
Precision Immersion Cleaning
Surface Wiping
Semiconductor Wafer Cleaning
Optical Lens & Instrument Cleaning
Electronics & PCB Defluxing
3. By Industry
Electronic & Semiconductor
Aerospace & Defense
Optical Product
Medical Device
4. By KB Value
Low KB (5-20)
Medium KB (20-40)
High KB (40-55)
Case Study for Bidding
Time: June 2024
Supplier: 3M Advanced Materials Division
Buyer: Leading Semiconductor Fab (Taiwan)
Product: High-Purity HFE Cleaning Fluid (Semiconductor Grade, Low-GWP)
Quantity: 1,800 tons
Contract Value: USD 79.6 million
Delivery Timeline: January 2025
Detailed Application Scenario
The semiconductor fab deployed 3M's high-purity HFE cleaner in wafer cleaning stations, photomask preparation units, and post-etch residue removal systems. Owing to its low surface tension and rapid evaporation, the HFE solution effectively removed micro-particulates and organic residues without leaving films or requiring secondary rinsing. Its excellent compatibility with metals, ceramics, elastomers, and polymer housings helped avoid corrosion and material swelling, improving equipment uptime.
The transition from traditional solvents reduced flammability risks, minimized hazardous emissions, and supported compliance with international environmental standards. Operating costs decreased due to lower solvent loss, longer bath life, and reduced ventilation requirements. The project illustrates how Hydrofluoroether Cleaners deliver superior cleaning performance while enabling high-tech manufacturers to achieve safer operations, regulatory compliance, and stable production quality.
About QY Research
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