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Rising Semiconductor Demand Driving The Growth Of The Market Due To Increasing Use In Electric Vehicles And Advanced Electronics: Strategic Insights Driving Chemical Mechanical Planarization (CMP) Slurry And Pads Market Momentum in 2025
Chemical Mechanical Planarization (CMP) Slurry And Pads
How Large Will the Chemical Mechanical Planarization (CMP) Slurry And Pads Market Size By 2025?
There has been a robust expansion in the size of the chemical mechanical planarization (CMP) slurry and pads market in the last few years. This market size will witness an escalation from the value of $2.71 billion in 2024 to $2.92 billion in 2025, representing a 7.8% compound annual growth rate (CAGR). Several factors have contributed to the growth in the past, such as the surging demand for advanced semiconductor nodes, increase in the production of foundries and logic devices, broadening of semiconductor manufacturing, and a hike in wafer production abilities.
How Big Is the Chemical Mechanical Planarization (CMP) Slurry And Pads Market Size Expected to Grow by 2029?
Projected growth for the chemical mechanical planarization (CMP) slurry and pads market is robust over the next few years, expected to reach $3.89 billion by 2029, growing at a compound annual growth rate (CAGR) of 7.5%. This projected growth in the period in question can be ascribed to an increase in semiconductor demand, advancement in automotive electronics, government initiatives and investments, and a growing necessity for power electronics. Noteworthy trends in the predicted period encompass the incorporation of artificial intelligence, evolution of intellectual property, 3D integration and cutting-edge packaging, strategic collaborations and partnerships, and the innovation of unique pad materials and designs.
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Which Key Market Drivers Powering Chemical Mechanical Planarization (CMP) Slurry And Pads Market Expansion and Growth?
The growth surge in the market is resultant of the escalating semiconductor demand, driven by its expanding utilization in electric vehicles and sophisticated electronics.
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What Trends Will Shape the Chemical Mechanical Planarization (CMP) Slurry And Pads Market Through 2029 and Beyond?
Leading organizations in the chemical mechanical planarization (CMP) slurry and pads market are prioritizing the development of advanced offerings, such as reusable CMP pad technology, to improve operational efficiency, reduce production expenses, and decrease environmental footprint. Reusable CMP pad technologies are innovations that give new life to used polishing pads, allowing for their reuse. This reduces waste and cost while maintaining the quality of semiconductor fabrication. For example, SK Hynix, a semiconductor firm out of South Korea, introduced a reusable CMP pad technology that refurbishes and revitalizes worn pads in January 2024. This revolutionary in-house development not only sidesteps existing patents but also promotes the firm's ESG objectives and bolsters supply chain resilience by reducing reliance on imported items. The technology, which will start phased adoption in 2024, helps SK Hynix reach its sustainability goals of using 25% recycled or renewable materials by 2025 and over 30% by 2030, thus improving environmental sustainability and supply chain resilience in the semiconductor industry.
What Are the Emerging Segments in the Chemical Mechanical Planarization (CMP) Slurry And Pads Market?
The chemical mechanical planarization (CMP) slurry and pads market covered in this report is segmented
1) By Product Type: Chemical Mechanical Planarization Slurries, Chemical Mechanical Planarization Pads
2) By Functionality: Polishing, Planarization
3) By Distribution Channel: Direct Sales, Distributors And Resellers, Aftermarket
4) By Application: Semiconductor Manufacturing, Optical Substrate, Disk Drive Components, Other Applications
5) By End-User: Integrated Device Manufacturers, Foundries, Memory Manufacturers, Other End Users
Subsegments:
1) By Chemical Mechanical Planarization Slurries: Silica-Based Slurries, Alumina-Based Slurries, Cerium Oxide-Based Slurries, Mixed Oxide Slurries
2) By Chemical Mechanical Planarization Pads: Hard Pads, Medium Pads, Soft Pads, Suba Pads
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Who Are the Global Leaders in the Chemical Mechanical Planarization (CMP) Slurry And Pads Market?
Major companies operating in the chemical mechanical planarization (CMP) slurry and pads market are Saint-Gobain SA, 3M Company, Applied Materials Inc., Merck KGaA, Fujifilm Holdings Corporation, AGC Inc., DuPont de Nemours Inc., Resonac Holdings Corporation, Ebara Corporation, Entegris Inc., JSR Corporation, Tokyo Seimitsu Co. Ltd., Soulbrain Holdings Co. Ltd., SK Enpulse Co. Ltd., Dongjin Semichem Co. Ltd., FNS Tech Co. Ltd., Praise Victor Industrial Co. Ltd., Pureon AG, Ace Nanochem Co. Ltd., and Horiba Ltd.
Which are the Top Profitable Regional Markets for the Chemical Mechanical Planarization (CMP) Slurry And Pads Industry?
Asia-Pacific was the largest region in the chemical mechanical planarization (CMP) slurry and pads market in 2024, and it is expected to be the fastest-growing region in the forecast period. The regions covered in chemical mechanical planarization (CMP) slurry and pads report are Asia-Pacific, Western Europe, Eastern Europe, North America, South America, Middle East and Africa.
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