MPCVD Machine for Lab and Diamond Growth Market Set to Surge - Key Insights You Must Know

MPCVD Machine for Lab and Diamond Growth Market

The global market for MPCVD Machine for Lab and Diamond Growth was valued at US$ million in the year 2024 and is projected to reach a revised size of US$ million by 2031, growing at a CAGR of %during the forecast period.

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Microwave plasma chemical vapor deposition (MPCVD) is the mainstream equipment for diamond growth. The gas sources used by MPCVD equipment mainly include hydrogen (H2), methane (CH4), nitrogen (N2) and oxygen (O2), which are cracked into H, O, N atoms or CH2, CH3, C2H2, OH and other groups under the action of microwave. Carbon containing groups (CH2, CH3, C2H2) will form gas-solid mixed interface on the diamond surface, and diamond (sp3), amorphous carbon or graphite (sp2) can be grown under the dynamic equilibrium model or non-equilibrium thermodynamic model. The etching speed of amorphous carbon or graphite (sp2) by hydrogen plasma is much faster than that of diamond (sp3), so the non diamond phase on the surface of CVD diamond is rapidly etched to achieve diamond growth. The basic structure of MPCVD equipment includes control unit, microwave unit, water cooling unit, vacuum unit, etc. The cavity is vacuumized through a vacuum unit to ensure the low vacuum state required for diamond growth. Then the control unit controls the flow rate and chamber pressure of each gas path, and leads the reaction gas source (CH4, H2, Ar, O2, N2, etc.) into the chamber and controls it at a certain chamber pressure. After the air flow is stabilized, microwave is generated through the microwave unit and guided into the cavity by the wave guide. Under the action of microwave field, the reaction gas is changed into plasma state to form a plasma ball suspended above the diamond substrate, and the substrate is heated to a certain temperature by using the high temperature of the plasma. The excess heat generated in the cavity is transmitted by the water cooling unit. In the MPCVD growth process of single crystal diamond, the optimal growth conditions are ensured by adjusting the power, gas source composition, cavity pressure and other conditions. In addition, due to the non contact between the plasma ball and the cavity wall, it ensures that there is no impurity particles in the diamond growth process and improves the diamond quality.

North American market for MPCVD Machine for Lab and Diamond Growth is estimated to increase from $ million in 2024 to reach $ million by 2031, at a CAGR of % during the forecast period of 2025 through 2031.

Asia-Pacific market for MPCVD Machine for Lab and Diamond Growth is estimated to increase from $ million in 2024 to reach $ million by 2031, at a CAGR of % during the forecast period of 2025 through 2031.

The major global manufacturers of MPCVD Machine for Lab and Diamond Growth include WEC Superabrasives, Wattsine, 6c Technology Ltd., Iplas GmbH, AllShare-Tech (Shanxi) Co., Ltd., Shenzhen Uniplasma Technology Co., Ltd., PLASSYS, Advanced Environmental Technologies Limited, Zhengzhou CY Scientific Instrument Co., Ltd., Kindle Tech Group Limited, etc. In 2024, the world's top three vendors accounted for approximately % of the revenue.

Report Scope

This report aims to provide a comprehensive presentation of the global market for MPCVD Machine for Lab and Diamond Growth, with both quantitative and qualitative analysis, to help readers develop business/growth strategies, assess the market competitive situation, analyze their position in the current marketplace, and make informed business decisions regarding MPCVD Machine for Lab and Diamond Growth.

The MPCVD Machine for Lab and Diamond Growth market size, estimations, and forecasts are provided in terms of output/shipments (Units) and revenue ($ millions), considering 2024 as the base year, with history and forecast data for the period from 2020 to 2031. This report segments the global MPCVD Machine for Lab and Diamond Growth market comprehensively. Regional market sizes, concerning products by Type, by Application, and by players, are also provided.

For a more in-depth understanding of the market, the report provides profiles of the competitive landscape, key competitors, and their respective market ranks. The report also discusses technological trends and new product developments.

The report will help the MPCVD Machine for Lab and Diamond Growth manufacturers, new entrants, and industry chain related companies in this market with information on the revenues, production, and average price for the overall market and the sub-segments across the different segments, by company, by Type, by Application, and by regions.

By Type
• Fully Automatic
• Semi-automatic

By Application
• Chemical vapor deposition (CVD) of Single Crystal and Polycrystalline Diamond Films and Diamond-like Films
• Surface Treatment and Modification of Materials
• Growth of Low Temperature Oxides

Key Companies
WEC Superabrasives, Wattsine, 6c Technology Ltd., Iplas GmbH, AllShare-Tech (Shanxi) Co., Ltd., Shenzhen Uniplasma Technology Co., Ltd., PLASSYS, Advanced Environmental Technologies Limited, Zhengzhou CY Scientific Instrument Co., Ltd., Kindle Tech Group Limited, Glomro, Carat Systems, MICROPHASE CO., LTD.

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