Deep UV KrF and ArF Photoresist Market Share Driven by Advanced Lithography Demand and Semiconductor Manufacturing Innovation | Valuates Reports

Deep UV KrF and ArF Photoresist Market
Deep UV KrF and ArF photoresists are key materials used in semiconductor manufacturing for deep UV lithography processes. KrF photoresist uses krypton fluoride laser as the light source, with a wavelength of 248 nanometers. KrF photoresist is suitable for relatively large process nodes, has high resolution and a long history of practical application. ArF photoresist uses an argon fluoride laser as a light source with a wavelength of 193 nanometers. ArF photoresist is suitable for smaller process nodes, with higher resolution and smaller line width capabilities.
The global Deep UV KrF and ArF Photoresist market was valued at US$ million in 2023 and is anticipated to reach US$ million by 2030, witnessing a CAGR of % during the forecast period 2024-2030.

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The Deep UV KrF and ArF Photoresist Market plays a critical role in advanced semiconductor manufacturing, supporting precise patterning processes essential for modern integrated circuits. Ongoing evolution in lithography techniques, shrinking device geometries, and increasing complexity in chip architectures are shaping current market trends and reinforcing steady market growth. Rising investment in semiconductor fabrication, tighter process control requirements, and growing emphasis on yield optimization are expanding the overall market size, while continuous material innovation is influencing purchasing behavior across foundries and device manufacturers.

By type, positive glue photoresists hold the largest market share, driven by their superior resolution, process stability, and widespread compatibility with KrF and ArF lithography systems used in high-volume manufacturing. These materials are also experiencing consistent market growth as fabs prioritize pattern fidelity and line-edge control. Negative glue photoresists, while holding a smaller share, are gaining traction in specialized processes where mechanical robustness and etch resistance are critical, contributing to a balanced and diverse type structure within the market.

From an application perspective, semiconductor memory manufacturing represents the leading segment in terms of market size, supported by continuous demand for high-density memory devices and process-node optimization. Wafer fabrication is emerging as one of the strongest contributors to market growth as logic and foundry players expand capacity and adopt advanced lithographic processes. Integrated circuit board applications maintain steady demand, while other niche applications support incremental growth and broaden the overall application base of the market.

Competitive dynamics in the Deep UV KrF and ArF Photoresist Market are shaped by established chemical and materials companies with strong formulation expertise and close relationships with semiconductor manufacturers. Leading players focus on enhancing photoresist sensitivity, resolution, and defect control to secure market share. Rapidly expanding companies are differentiating through localized production, customized formulations, and responsive technical support, strengthening their positioning in both mature and emerging semiconductor ecosystems.

Regionally, Asia-Pacific dominates the market share, supported by concentrated semiconductor manufacturing activity across China, Japan, South Korea, Taiwan, and India. Strong fabrication capacity, technology adoption, and supply chain integration drive regional leadership. North America and Europe maintain important roles due to advanced research capabilities, high-end fabrication processes, and ongoing innovation in photoresist chemistry. Southeast Asia and Latin America are witnessing rising consumption as semiconductor assembly and fabrication-related activities expand. The market forecast remains positive, underpinned by continued lithography advancements, capacity expansion in semiconductor manufacturing, and sustained demand for high-performance photoresist materials aligned with next-generation device requirements.

Segment by Type

• Positive Glue
• Negative Glue

Segment by Application

• Semiconductor Memory
• Wafer Fabrication
• Integrated Circuit Board
• Others

By Company

Tokyo Ohka Kogyo (TOK), JSR Micro, Fujifilm Holdings Corporation, Shin-Etsu Chemical, DuPont, Dongjin Semichem, Merck KGaA, Hitachi Chemical, Sumitomo Bakelite, LG Chem, Everlight Electronics, Kolon Industries, Dow Chemical Company, HMT (Xiamen) New Material Technology, Jiangsu Nata Opto-electronic Material, Shanghai Sinyang Semiconductor Materials, Crystal Clear Electronic Material, Red Avenue New Materials, Shenzhen RongDa Photosensitive Science & Technology

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