Chemical Mechanical Planarization (CMP) Ancillaries Market Set to Surge - Key Insights You Must Know

The global market for Chemical Mechanical Planarization (CMP) Ancillaries was valued at US$ million in the year 2024 and is projected to reach a revised size of US$ million by 2031, growing at a CAGR of %during the forecast period.

Chemical Mechanical Planarization (CMP) is a polishing process used to manufacture wafers for the semiconductor industry. It requires the use of a polishing pad and polishing slurry. In this report, the Chemical Mechanical Planarization (CMP) Ancillaries was counted, including CMP Pad Conditioners, CMP Filters, CMP PVA Brush and CMP Retaining Rings.

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North American market for Chemical Mechanical Planarization (CMP) Ancillaries is estimated to increase from $ million in 2024 to reach $ million by 2031, at a CAGR of % during the forecast period of 2025 through 2031.

Asia-Pacific market for Chemical Mechanical Planarization (CMP) Ancillaries is estimated to increase from $ million in 2024 to reach $ million by 2031, at a CAGR of % during the forecast period of 2025 through 2031.

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The major global manufacturers of Chemical Mechanical Planarization (CMP) Ancillaries include 3M, Kinik Company, Saesol, Entegris, Morgan Technical Ceramics, Nippon Steel & Sumikin Materials, Shinhan Diamond, CP TOOLS, Pall, Cobetter, etc. In 2024, the world's top three vendors accounted for approximately % of the revenue.

By Type
• CMP Pad Conditioners
• CMP Filters
• CMP PVA Brush
• CMP Retaining Rings

By Application
• 300 mm Wafer
• 200 mm Wafer
• Others

Key Companies
3M, Kinik Company, Saesol, Entegris, Morgan Technical Ceramics, Nippon Steel & Sumikin Materials, Shinhan Diamond, CP TOOLS, Pall, Cobetter, Critical Process Filtration, INC, Graver Technologies, Parker Hannifin Corporation, Roki Techno Co Ltd., Aion, BrushTek, ITW Rippey, Coastal PVA, Stat Clean, Akashi, Ensigner, Mitsubishi Chemical Advanced Materials, SPM Technology, SemPlastic, LLC, Victrex, Willbe S&T, TAK Materials Corporation

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