Chemical Mechanical Planarization (CMP) Slurry Market Revenue Estimates and Growth Analysis, Recent Trends and Demand by Top Vendors 2021

The report presents an in-depth assessment of the Global Chemical Mechanical Planarization (CMP) Slurry including enabling technologies, key trends, market drivers, challenges, standardization, regulatory landscape, deployment models, operator case studies, opportunities, future roadmap, value chain, ecosystem player profiles and strategies. The report also presents forecasts for Global Chemical Mechanical Planarization (CMP) Slurry investments from 2020 till 2023.

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The chemical mechanical planarization (CMP) slurry market is expected to register a CAGR of 7% during the forecast period(2020 - 2025).

- With the rising trend of miniaturization, a need for higher density integration in a limited space makes semiconductors very compact. In such a scenario, CMP has emerged as a necessary planarization process in the manufacture of integrated circuits (IC) products because of its effective performance in thinning and flattening thin films.

- Thus, the CMP slurry, containing rinsing agent helps prevent particle adhesion, simplifies the wafer cleaning process and also helps in improving planarity along with reducing defectivity. Due to these factors, they are anticipated to be the next generation of polishing systems, over the forecast period.

- Further, the increasing penetration of smart devices is driving the consumer electronics market which increases the need for a smaller size, more reliable, and low-cost storage solutions. Thereby, increasing the demand for CMP process which in return would drive the market for the CMP slurries.

Top Leading Manufactures-

Cabot Microelectronics Corporation?, Hitachi Chemical Co Ltd.?, Fujifilm Corporation, Fujimi Corporation?, Dow Inc., Merck KGaA (Including Versum Materials)?, Saint-Gobain Ceramics & Plastics, Inc.,

Industry Analysis:

Memory Occupies the Significant Shares

- Flash memory has been an important driving force due to the increasing popularity of mobile devices with large storage requirements. Also, emerging technology such as NVM (Non-Volatile Memory) which offers better speed and durability compared with traditional NAND is expected to poise the memory growth. With such enhancements, the CMP process would play a significant role, which in result would drive the CMP slurry market as well
- As the NAND technology moved from 2D to 3D, there are additional CMP steps added such as channel poly CMP and staircase (or ILD) CMP. Channel poly CMP is to polish many materials simultaneously such as SiN, oxide, and poly-Si, therefore, it needs individual material rate tunability to meet the final topography requirement. Thereby increasing the demand for the CMP slurry market.

China to Witness Fastest Growth

- With the rising trade war between the United States and China, China is pushing ahead with the development of its own chip industry. Also, Chinese firms such as Huawei Technologies Co., Ltd has been banned from American technology, which is further boosting Chinas push for its own semiconductor industry.
- Also with the government initiative such as Made in China 2025 plan, aims to boost the production of higher-value products. As a result, China aims to produce 40% of the semiconductors it uses by 2020 and 70% by 2025..

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Key Developments in the Market

- January 2020 - Entegris Inc, acquired Sinmat, a CMP slurry manufacturer. Sinmat's Chemical Mechanical Planarization (CMP) slurries are used for polishing ultra-hard surface materials, including SiC (silicon carbide) and GaN (gallium nitride). SiC and GaN are substrates utilized in the fast-growing end-markets of power electronics and advanced communications. This acquisition has enhanced the product offerings of Entegris Inc.

- November 2019 - Entegris Inc, opened its China Technology Center (CTC) as part of its strategy to expand its technical services in the Asia-Pacific region. China Technology Center comprises four labs, namely a Microcontamination Control Application Lab, an Advanced Material Handling Application Lab, a Surface Preparation and Integration Application Lab, and an Analytical and Metrology Lab. These labs focused on providing solutions, across the regional semiconductor manufacturing industry.

What are the market factors that are explained in the report?

–Key Strategic Developments: The study also includes the key strategic developments of the market, comprising R&D, new product launch, M&A, agreements, collaborations, partnerships, joint ventures, and regional growth of the leading competitors operating in the market on a Global and regional scale.

–Key Market Features: The report evaluated key market features, including revenue, price, capacity, capacity utilization rate, gross, production, production rate, consumption, import/export, supply/demand, cost, market share, CAGR, and gross margin. In addition, the study offers a comprehensive study of the key market dynamics and their latest trends, along with pertinent market segments and sub-segments.

–Analytical Tools: Global Chemical Mechanical Planarization (CMP) Slurry Market report includes the accurately studied and assessed data of the key industry players and their scope in the market by means of a number of analytical tools. The analytical tools such as Porter’s five forces analysis, feasibility study, and investment return analysis have been used to analyzed the growth of the key players operating in the market. 

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