Electron Beam Metrology & Inspection Equipment Market Set to Surge - Key Insights You Must Know

Electron Beam Metrology & Inspection Equipment Market Size

The global market for Electron Beam Metrology & Inspection Equipment was valued at US$ 3126 million in the year 2024 and is projected to reach a revised size of US$ 4960 million by 2031, growing at a CAGR of 6.8% during the forecast period.

Semiconductor Metrology & Inspection Equipment runs through every process of wafer manufacturing, from design verification to process control detection to wafer testing and finished product testing. Metrology & Inspection Equipment plays a vital role in controlling and improving the yield of wafer manufacturing. According to the testing link, semiconductor Metrology & Inspection can be divided into front-end inspection and back-end inspection. Front-end Metrology & Inspection occurs in the wafer preparation and silicon wafer manufacturing process, including the Metrology of various film thicknesses, nanostructure critical dimensions (CD), overlay errors and other dimensional parameters formed in the silicon wafer manufacturing process, and wafer surface defects, to ensure that the yield of the processing line is controlled above the specified level. According to different functions, front-end Metrology & Inspection equipment is divided into Metrology and defect inspection. The former is mainly for film thickness, film stress, critical dimensions, doping concentration, etc., and the latter is mainly used for wafer surface defect inspection, which is one of the keys to process control and yield management in semiconductor manufacturing.

The purpose of defect inspection is to accurately identify, locate and classify key defects (DOI, which refers to any defect type that is considered to have an impact on yield, reliability or performance) on the inspected wafer, thereby helping defect and yield engineers to quickly resolve defect problems, which is of great significance for wafer fabs to reduce production costs and improve wafer yield.

Electron Beam Metrology & Inspection Equipment plays a vital role in semiconductor manufacturing, and is mainly used for inspection of physical defects and electrical defects of wafers and integrated circuits, as well as the size Metrology of key graphics. These devices use electron beams to scan the wafers to be tested, obtain high-resolution electron beam images, and use different algorithms to analyze information such as defects and key dimensions on the wafers.

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Electron Beam Metrology & Inspection Equipment includes three core equipments, each of which realizes precise control in semiconductor manufacturing through differentiated algorithms: DR-SEM performs sampling positioning based on the defect coordinates provided by optical detection, and completes defect authenticity identification and classification verification by collecting high-resolution SEM images; Electron beam wafer defect inspection equipment (EBI) adopts full scanning detection mode, batch acquires SEM images in the specified area according to the preset detection formula, and uses intelligent analysis algorithms to directly identify and classify micron to nanometer physical/potential defects; CD-SEM focuses on precise size control, accurately reaches the preset measurement coordinates through the automatic focus system, and after collecting images of specific areas, uses pixel-level computing technology to achieve nanometer-level measurement of key structural parameters such as line width and aperture, and feeds back the measurement data to the process equipment in real time to form a closed-loop control. The three types of equipment respectively undertake the functions of defect review, comprehensive screening and precise measurement through algorithm optimization, and jointly build a quality assurance system for advanced semiconductor processes.

From the production side, the core production areas of Electron Beam Metrology & Inspection Equipment are mainly the United States, Europe, Japan and China, among which the United States is the main production area, accounting for 46.5% of the market share in 2024. There are still large differences between Chinese Electron Beam Metrology & Inspection Equipment companies and international leading companies (such as Applied Materials and Hitachi High-Tech) in the application, technology, and product performance of advanced support fields. However, as the localization process of Chinese local manufacturers accelerates, some Chinese local companies have also gained a certain market share in the electron beam inspection and measurement equipment market, such as Jingce Electronic and DJEL. In addition, in recent years, there have been many new entrants from Chinese local enterprises, such as Wellrun Microelectronics, Suzhou Siscantech, Beijing Hengren, Wuxi Genxinyue Technology Co., Ltd, Suzhou AISTech, etc. However, at present, their scale is relatively small or some are still in the Demo stage. With the future development of China's semiconductor market, it is expected that the global competitive share of Chinese local manufacturers will gradually increase in the next few years, and China will maintain the fastest growth rate. With the advancement of China's Electron Beam Metrology & Inspection Equipment technology, the emergence of cost advantages and the strengthening of policy support, it is expected that the share will reach 4.9% in 2031.

In the future, as DRAM (high-bandwidth storage) and NAND technologies continue to become investment hotspots, the three-dimensional stacking architecture and performance limits of memory chips will place higher demands on semiconductor front-end Metrology & Inspection equipment. In order to meet the challenges of increased storage unit density and more complex processes, wafer inspection equipment needs to iterate to sub-nanometer precision and simultaneously develop full-dimensional inspection capabilities for defect location, material property analysis, and three-dimensional structure characterization. This technology upgrade that integrates optics, electron beams, and AI algorithms is becoming a key breakthrough direction for memory chip yield control and industry chain autonomy.

By Type
• Electron Beam Metrology Equipment
• Electron Beam Inspection Equipment

By Application
• Wafer
• Mask

Key Companies
Applied Materials, Hitachi High-Tech, ASML, KLA, Advantest, Holon Co., Ltd, Wuhan Jingce Electronic Group, DJEL, Wellrun Microelectronics, Suzhou Siscantech, Beijing Hengren

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