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Deep Reactive Ion Etch Equipment Market Set to Surge - Key Insights You Must Know
Deep Reactive Ion Etch Equipment Market SizeThe global Semiconductor Etch Equipment revenue was US$ 22730 million in 2022 and is forecast to a readjusted size of US$ 49330 million by 2029 with a CAGR of 11.2% during the forecast period (2023-2029).
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Global key players of semiconductor etch equipment include Lam Research, TEL, Applied Materials, Hitachi High-Tech and AMEC. The top three players of semiconductor etch equipment account for approximately 90% of the total market. North America is the largest producer, holds a share around 60%, followed by Japan and Europe, with share 35% and 3%, separately.
The report will help the Deep Reactive Ion Etch Equipment manufacturers, new entrants, and industry chain related companies in this market with information on the revenues, production, and average price for the overall market and the sub-segments across the different segments, by company, by Type, by Application, and by regions.
By Type
• Inductively Coupled Plasma (ICP)
• Capacitive Coupled Plasma (CCP)
• Reactive Ion Etching (RIE)
• Deep Reactive Ion Etching (DRIE)
By Application
• MEMS
• Advanced Packaging
• Power Devices
• Medical
Key Companies
Lam Research, Akrion, ULVAC, CORIAL, TEL, Applied Materials, Hitachi High-Technologies, Oxford Instruments, SPTS Technologies, Plasma-Therm, GigaLane, SAMCO, AMEC, NANO-MASTER, Sumitomo Precision Products
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