Chemically Amplified Photoresists Market Share Driven by Rising Semiconductor Miniaturization and Advanced Lithography Demand | Valuates Reports

Chemically Amplified Photoresists Market
The global market for Chemically Amplified Photoresists was valued at US$ million in the year 2024 and is projected to reach a revised size of US$ million by 2031, growing at a CAGR of %during the forecast period.

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The Chemically Amplified Photoresists market is gaining strong momentum as semiconductor manufacturers advance toward finer geometries, improved pattern fidelity, and higher productivity in modern lithography processes. Market trends show increasing reliance on high-performance resist materials driven by scaling in logic and memory devices, rapid adoption of EUV and DUV systems, and evolving buyer demand for greater sensitivity, resolution, and process stability. These developments are shaping the overall market size while supporting continuous market growth across global semiconductor ecosystems.

In terms of type, positive chemically amplified photoresists hold the largest market share due to their essential role in high-resolution pattern transfer and broad compatibility with advanced lithography tools. Their ability to deliver consistent performance across leading production environments makes them the dominant category. Negative chemically amplified photoresists are expanding at a faster pace, supported by specialized applications requiring higher etch resistance and improved structural robustness. Both types contribute to a diversified portfolio needed to support advanced device manufacturing.

From the application perspective, the foundry segment leads the market share as fabs worldwide increase investments in cutting-edge semiconductor production, boosted by demand for logic chips, power electronics, and high-volume device manufacturing. The IDM segment is experiencing strong market growth, driven by integrated manufacturers optimizing internal production capabilities and adopting advanced resist formulations for a wide range of device architectures. Additional applications also support overall market size and reinforce the broader adoption of chemically amplified photoresists.

Major companies including TOK, JSR, Shin-Etsu Chemical, Fujifilm, Sumitomo Chemical, Dongjin Semichem, and DuPont maintain strong competitive positions through their broad material portfolios, advanced resist technologies, and ongoing innovation in formulation science. These companies strengthen market share by enhancing process reliability, improving purity levels, and collaborating with semiconductor fabs to meet evolving lithography requirements. Their technological capabilities and strategic investments enable continued expansion into next-generation production lines.

Regionally, Asia-Pacific dominates the market share due to its concentration of leading wafer fabrication facilities and rapid adoption of advanced lithography platforms. North America and Europe also represent significant demand centers supported by strong R&D activity and high-end semiconductor production. Southeast Asia and Latin America are showing accelerating market growth as investments in electronics manufacturing increase. The overall market forecast points to sustained progress driven by innovation in resist chemistry, adoption of leading-edge lithography nodes, expanding fabrication capacity, and continued demand for high-performance materials across the semiconductor value chain.

by Type

• Positive Photoresist
• Negative Photoresist

by Application

• Foundry
• IDM

By Company

TOK, JSR, Shin-Etsu Chemical, Fujifilm, Sumitomo Chemical, Dongjin Semichem, DuPont

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