Extreme Ultraviolet Lithography Mask Blanks Market Share Driven by High-Precision Semiconductor Manufacturing and Advanced IC Fabrication | Valuates Reports

Extreme Ultraviolet Lithography Mask Blanks Market Size
The global market for Extreme Ultraviolet Lithography Mask Blanks was valued at US$ 75.6 million in the year 2024 and is projected to reach a revised size of US$ 122 million by 2031, growing at a CAGR of 7.2% during the forecast period.

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The Extreme Ultraviolet Lithography (EUV) Mask Blanks Market is expanding rapidly as semiconductor manufacturers accelerate the transition toward next-generation chip fabrication technologies. Increasing demand for smaller node geometries, higher transistor density, and improved energy efficiency is shaping overall market size and market growth. Market trends strongly reflect rising EUV adoption across leading fabs, driven by the need for precision, reliability, and defect-free mask substrates that support advanced patterning requirements.

Quartz Mask blanks hold the largest market share due to their superior optical clarity, thermal stability, and ability to deliver consistent performance under EUV exposure conditions. Soda Mask blanks are registering growing interest as a cost-effective alternative for specific fabrication processes, while other specialty mask types support niche applications that require unique material properties. Together, these segments underscore the industry's continued push to refine mask quality and ensure optimal throughput in semiconductor lithography workflows.

The semiconductor industry is the dominant application segment, propelled by intensive scaling activities and the push for advanced logic and memory device manufacturing. IC production contributes significantly to overall market share as foundries and integrated device manufacturers adopt EUV-enabled processes to maintain competitive performance roadmaps. Other applications also benefit from high-precision lithography materials, supporting broader electronics manufacturing ecosystems.

Leading companies-AGC Electronics America, Hoya, S&S Tech, and Applied Materials-hold strong positions in the market through expertise in ultra-flat substrates, defect management technologies, and advanced coating processes. Their strategic investments in manufacturing capacity, surface treatment innovation, and high-purity materials strengthen competitive differentiation while supporting the evolving needs of semiconductor fabrication facilities worldwide.

Regionally, North America and Asia-Pacific exhibit dominant consumption driven by large semiconductor manufacturing clusters and high adoption of EUV processes. Europe maintains strong market presence supported by research hubs and precision manufacturing capabilities. China, Japan, and South Korea continue to show notable market growth as they expand domestic semiconductor ecosystems. With ongoing innovation in mask blank materials, surface engineering, and production technologies, the market forecast indicates sustained market growth as EUV lithography becomes increasingly central to global chip production roadmaps.

by Type
• Quartz Mask
• Soda Mask
• Others

by Application

• Semiconductor
• IC
• Others

By Company

AGC Electronics America, Hoya, S&S Tech, Applied Materials

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