SiC Epitaxial CVD System Market Set to Surge - Key Insights You Must Know

SiC Epitaxial CVD System Market

The global market for SiC Epitaxial CVD System was valued at US$ million in the year 2024 and is projected to reach a revised size of US$ million by 2031, growing at a CAGR of %during the forecast period.

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In the SiC Epitaxial CVD system, silicon source and carbon source are introduced in the form of gaseous precursors by accurately controlling the gas flow, temperature, pressure and atmospheric conditions in the reaction chamber, and allow them to melt on the pre-prepared single crystal SiC substrate. A chemical reaction occurs on the substrate, resulting in the growth of a high-quality SiC film oriented along the crystal plane of the substrate that matches the crystal lattice of the substrate. This kind of film is usually used to manufacture high-performance power semiconductor devices, such as diodes, MOSFETs, IGBTs, etc. These devices are widely used in electric vehicles, solar inverters, power conversion systems and other fields that require extremely high efficiency and reliability.

North American market for SiC Epitaxial CVD System is estimated to increase from $ million in 2024 to reach $ million by 2031, at a CAGR of % during the forecast period of 2025 through 2031.

Asia-Pacific market for SiC Epitaxial CVD System is estimated to increase from $ million in 2024 to reach $ million by 2031, at a CAGR of % during the forecast period of 2025 through 2031.

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The major global manufacturers of SiC Epitaxial CVD System include Tokyo Electron Limited, Equiluvac (Veeco), Nuflare, ASM International, AIXTRON, M.WATANABE, Naura, JSG, Sicentury, Xiamen Yunmao, etc. In 2024, the world's top three vendors accounted for approximately % of the revenue.

By Type
• Single Wafer Type
• Dual Wafer Type

By Application
• 4 Inch Epitaxial Wafer
• 6 Inch Epitaxial Wafer
• 8 Inch Epitaxial Wafer

Key Companies
Tokyo Electron Limited, Equiluvac (Veeco), Nuflare, ASM International, AIXTRON, M.WATANABE, Naura, JSG, Sicentury, Xiamen Yunmao, Shenzhen Naso Tech

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