Press release
Light Source for EUV Lithography Market Set to Surge - Key Insights You Must Know
Light Source for EUV Lithography MarketThe global market for Light Source for EUV Lithography was valued at US$ million in the year 2024 and is projected to reach a revised size of US$ million by 2031, growing at a CAGR of %during the forecast period.
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North American market for Light Source for EUV Lithography is estimated to increase from $ million in 2024 to reach $ million by 2031, at a CAGR of % during the forecast period of 2025 through 2031.
Asia-Pacific market for Light Source for EUV Lithography is estimated to increase from $ million in 2024 to reach $ million by 2031, at a CAGR of % during the forecast period of 2025 through 2031.
The major global manufacturers of Light Source for EUV Lithography include ASML (Cymer), Energetiq, Research Instruments GmbH, Gigaphoton, etc. In 2024, the world's top three vendors accounted for approximately % of the revenue.
By Type
• DPP Source
• LPP Source
By Application
• DRAM
• Logic Chip
Key Companies
ASML (Cymer), Energetiq, Research Instruments GmbH, Gigaphoton
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