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Computational Lithography Software Market Set to Surge - Key Insights You Must Know
Computational Lithography Software Market SizeThe global market for Computational Lithography Software was valued at US$ 1214 million in the year 2024 and is projected to reach a revised size of US$ 3023 million by 2031, growing at a CAGR of 14.1% during the forecast period.
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Computational lithography software is a tool used to optimize and simulate lithography processes and is widely used in semiconductor manufacturing. It guides the optimization of lithography process parameters by computer simulation and simulation of the photochemical reactions and physical processes of the lithography process.
Manufacturing computer chips requires a key step called computational lithography, which is a complex calculation involving electromagnetic physics, photochemistry, computational geometry, iterative optimization, and distributed computing. This computational lithography step is already one of the largest computing workloads in semiconductor production, requiring a large number of data centers, and the evolution of silicon miniaturization will exponentially amplify computing needs over time. The task of creating masks for the manufacturing process has been an integral part of semiconductor manufacturing for decades. With the move to more advanced nodes such as 5nm, 3nm to 2nm, accelerating computational lithography turnaround time helps semiconductor manufacturing companies manufacture chips efficiently.
Global key players of Computational Lithography Software include ASML, KLA and Siemens, etc. The top three players hold a share over 80%. China Taiwan is the largest market, has a share about 26%. In terms of product type, OPC is the largest segment, occupied for a share of about 42%, and in terms of application, Logic/MPU has a share about 50 percent.
The development of lithography software is moving towards higher precision and faster processing speeds. In the future, artificial intelligence and machine learning will be widely used in lithography software for automated optimization and defect detection. In addition, the software will pay more attention to integration with other manufacturing links to improve overall production efficiency and yield rate.
By Type
• OPC
• SMO
• MPT
• ILT
By Application
• Memory
• Logic/MPU
Key Companies
ASML, KLA, Siemens, Synopsys, Cadence, Dongfang Jingyuan Electron Co., Ltd., Yuwei Optics
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