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Extreme Ultraviolet Lithography Mask Blanks Market Size, Revenue Share, Insights & Future Outlook
Extreme Ultraviolet Lithography Mask Blanks Market SizeThe global market for Extreme Ultraviolet Lithography Mask Blanks was valued at US$ 75.6 million in the year 2024 and is projected to reach a revised size of US$ 122 million by 2031, growing at a CAGR of 7.2% during the forecast period.
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The EUV Light Sources Market is witnessing significant market growth as extreme ultraviolet (EUV) lithography becomes a critical technology for advanced semiconductor fabrication. Increasing demand for smaller, faster, and energy-efficient chips across consumer electronics, automotive, and IT sectors is shaping the overall market size. Key market trends include higher light source power for improved throughput, enhanced reliability, and the integration of next-generation lithography tools, which together drive adoption across global semiconductor fabs and equipment factories.
By type, high-power EUV light sources dominate the market share, supporting high-volume manufacturing and ensuring consistent wafer exposure for advanced nodes. Low-power EUV light sources are experiencing rapid market growth, as they are increasingly deployed for R&D, pilot production, and specialized applications requiring precision with lower energy consumption. Both types play complementary roles in maintaining efficiency, resolution, and yield across lithography operations.
From an application perspective, the fab segment holds the largest market share, driven by the need for high-intensity, reliable light sources to support mass semiconductor production. The equipment factory segment is witnessing notable market growth, as suppliers of EUV tools require advanced light sources for equipment calibration, testing, and process optimization. The synergy between these applications ensures robust adoption and operational efficiency across the semiconductor ecosystem.
Leading companies including Cymer, Gigaphoton, Ushio, and ISTEQ BV hold significant market share by delivering high-quality, durable, and efficient EUV light sources. These companies are driving market growth through technological innovations, process optimization, and strategic collaborations with semiconductor manufacturers. Investments in R&D, regional service networks, and continuous product enhancement reinforce their leadership positions and influence broader market trends.
Regionally, Asia-Pacific dominates both production and consumption, led by China, Japan, South Korea, and Taiwan, where semiconductor manufacturing infrastructure is highly advanced. North America remains a major contributor due to technological leadership and domestic fab expansion. Europe provides precision manufacturing expertise and advanced component development. Emerging markets in India, Mexico, and Brazil are poised for growth as semiconductor adoption rises. The market forecast anticipates continued innovation, increased fab deployment, and expansion of global EUV capacity, reinforcing ongoing market growth and shaping future market trends.
By Type
• Quartz Mask
• Soda Mask
By Application
• Semiconductor
• IC
Key Companies
AGC Electronics America, Hoya, S&S Tech, Applied Materials
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