Extreme Ultraviolet Lithography (EUVL) Market Share Driven by Semiconductor Miniaturization and Advanced Chip Fabrication | Valuates Reports

Extreme Ultraviolet Lithography (EUVL) Market Size

The global market for Extreme Ultraviolet Lithography (EUVL) was valued at US$ 726 million in the year 2024 and is projected to reach a revised size of US$ 1930 million by 2031, growing at a CAGR of 15.2% during the forecast period.

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The Extreme Ultraviolet Lithography (EUVL) market is witnessing strong market growth fueled by the accelerating demand for advanced semiconductor manufacturing and miniaturized electronic components. As chipmakers transition toward smaller process nodes, EUVL technology has emerged as the cornerstone for next-generation lithography. Key market trends include the integration of EUV systems in high-performance computing, artificial intelligence, and 5G chip production. The need for higher transistor density and improved energy efficiency is expanding the overall market size, positioning EUVL as a critical enabler for the future of semiconductor innovation.

By type, the light source segment holds the largest market share, driven by its pivotal role in defining the precision and throughput of EUV lithography systems. Mirror systems, essential for reflecting EUV light at extreme wavelengths, also play a key role in maintaining pattern accuracy and reducing energy loss. Masks and other components, including pellicles and sensors, continue to evolve through collaborative innovation between materials science and optics manufacturers, ensuring the reliability and scalability of EUVL processes across global fabs.

In terms of application, foundries represent the leading segment, leveraging EUVL to enhance wafer yields and enable high-volume production of advanced nodes for smartphones, data centers, and automotive chips. Integrated Device Manufacturers (IDMs) are also rapidly adopting EUVL to maintain design sovereignty and optimize chip performance across proprietary architectures. Other niche applications in research and pilot lines are supporting the overall market growth as chipmakers invest in process refinement and defect reduction technologies.

From a company perspective, ASML remains the dominant leader with the largest market share, supplying complete EUV systems to the world's top semiconductor manufacturers. Zeiss plays a crucial role as a key optics partner, providing precision mirrors essential for EUV light manipulation. Nikon and Canon continue to strengthen their lithography portfolios, investing in alternative technologies and incremental innovation to remain competitive. NTT Advanced Technology contributes with material and component expertise, underscoring the ecosystem's collaborative nature. Collectively, these companies are shaping the global market trends through R&D alliances, supply chain integration, and advancements in optical precision.

Regionally, Asia-Pacific, particularly China, Japan, South Korea, and Taiwan, dominates EUVL adoption due to strong semiconductor manufacturing bases and government initiatives supporting domestic chip production. North America and Europe follow closely, driven by strategic investments in lithography R&D and supply chain resilience. The market forecast indicates sustained expansion as more fabs transition from deep ultraviolet to EUV processes. Continued innovation in light sources, mirror coatings, and pellicle materials will define the next phase of market growth, strengthening the global semiconductor ecosystem through enhanced productivity, energy efficiency, and advanced chip capabilities.

By Type
Light Source
Mirrors
Mask

By Application
Integrated device manufacturers (IDM)
Foundry

Key Companies
ASML, Nikon, Canon, Zeiss, NTT Advanced Technology

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