Global and U.S. Nickel Oxide Thin Film Market Report, Published by QY Research.

Nickel Oxide Thin Film is a functional transition metal oxide layer widely used in electronics, optics, and energy devices due to its p-type semiconducting behavior, optical transparency, electrochromism, and catalytic activity. Deposited via methods such as sputtering, sol-gel, pulsed laser deposition, or chemical vapor deposition (CVD), NiO thin films exhibit high thermal stability, wide bandgap (~3.6-4.0 eV), and tunable electrical conductivity. They are commonly applied in electrochromic smart windows, thin-film transistors, photovoltaic cells (as hole transport layers), sensors, fuel cells, and catalysis.

https://www.qyresearch.com/reports/5057930/nickel-oxide-thin-film

Core market data:

Global market size: USD 686 million

CAGR (2024-2030): 7.1%

Unit price: USD 85-260 per m2

Annual production: 4.1 million m2

Gross margin: 39%

Production capacity: 5.5 million m2

List of Main players:

Materion (USA)

Kurt J. Lesker (USA)

Testbourne (UK)

Admat (USA)

Neyco (France)

AbleTarget (China)

Cathay Advanced Materials (China)

Jinxing Metals (China)

EdgeTech Industries (USA)

ACI Alloys (USA)

Upstream supply is centered on high-purity nickel oxide feedstocks, metal-organic precursors, and sputtering or evaporation targets, all of which are critical to ensuring film uniformity and performance in advanced electronic and optical applications. Key raw materials include nickel carbonate and nickel hydroxide, which are calcined to produce NiO powders with controlled stoichiometry and particle size. For sol-gel routes, high-purity solvents (e.g., ethanol, 2-methoxyethanol) and chelating agents are used to stabilize precursor solutions. In physical vapor deposition (PVD) and chemical vapor deposition (CVD) processes, argon and oxygen carrier gases are essential to control plasma parameters and film oxidation states. The upstream segment is capital-intensive, requiring high-vacuum systems, sputtering targets, cleanroom infrastructure, plasma generators, and precision temperature control systems. Suppliers are concentrated in regions with advanced materials industries-such as the U.S., Germany, Belgium, China, and South Korea-where the integration of materials refinement and equipment manufacturing allows for consistent quality control and scalability.

Downstream demand is growing rapidly due to NiO's unique combination of optical transparency, p-type semiconductivity, and electrochromic properties, making it a key enabling material in next-generation energy and electronic devices. Major end users include manufacturers of electrochromic smart windows, where NiO films act as complementary layers to tungsten oxide (WO3), enabling color modulation and energy-efficient building solutions. In the photovoltaic sector, NiO thin films are widely adopted as hole transport layers in perovskite solar cells, dye-sensitized solar cells, and organic photovoltaics, improving device stability and power conversion efficiency. Transparent thin-film transistors (TFTs), gas sensors, and photoelectrochemical devices also leverage NiO's wide bandgap and defect tunability for enhanced performance. Furthermore, solid oxide fuel cells (SOFCs) use NiO-based layers in anodes due to their catalytic and thermal stability properties. Demand is particularly strong in regions investing in building-integrated photovoltaics, smart infrastructure, and renewable energy systems, including Europe, East Asia, and North America.

For Inquiries:

USA: +1-626-295-2442

Canada: +1-778-907-6631

China: +86-150-1303-8387

Japan: +81-90-3800-9273

South Korea: +82-2883-1278

India: +91-866-9986-909

Indonesia: +62-818-510-991

Germany: +49-15788468916

Switzerland: +41-765899438

Portugal: +351-910983247

Email: global@qyresearch.com

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