Nylon Filter for Photoresist Research:CAGR of 7.56% during the forecast period

Nylon Filter for Photoresist Market Summary

According to the new market research report "Global Nylon Filter for Photoresist Market Report 2025-2031", published by QYResearch, the global Nylon Filter for Photoresist market size is projected to grow from USD 165.33 million in 2025 to USD 256.01 million by 2031, at a CAGR of 7.56% during the forecast period.

Figure00001. Global Nylon Filter for Photoresist Market Size (US$ Million), 2019-2030

Nylon Filter for Photoresist

Above data is based on report from QYResearch: Global Nylon Filter for Photoresist Market Report 2024-2030 (published in 2024). If you need the latest data, plaese contact QYResearch.

Figure00002. Global Nylon Filter for Photoresist Top 9 Players Ranking and Market Share (Ranking is based on the revenue of 2023, continually updated)

Nylon Filter for Photoresist

Above data is based on report from QYResearch: Global Nylon Filter for Photoresist Market Report 2024-2030 (published in 2024). If you need the latest data, plaese contact QYResearch.

This report profiles key players of Nylon Filter for Photoresist such as Pall, Entegris, Solventum, Cobetter, ADVANTEC.

In 2023, the global top five Nylon Filter for Photoresist players account for 73.8% of market share in terms of revenue. Above figure shows the key players ranked by revenue in Nylon Filter for Photoresist.

Key Drivers:

Semiconductor fab expansion, increased investment in new fabs, rising wafer throughput, and tightening defect budgets mean higher filter consumption (both spot/spot filters and bulk cartridge filters).

The shift to EUV (extreme ultraviolet) lithography and ArF immersion systems requires filters with exceptional chemical inertness and low outgassing properties. Nylon filters support EUV, ArF, and KrF photoresists while minimizing contamination with metal ions and organic residues. These filters feature a dual-pass degassing design to eliminate microbubbles-critical for EUV processes, where even tiny defects can render a wafer unusable.

Chemical Compatibility and Process Uptime: Nylons (e.g., Nylon 6/6) are widely used due to their mechanical strength and good compatibility with a wide range of photoresists/solvents; compatibility charts and supplier verification are decisive purchasing factors.

Key Obstacles:

As feature sizes shrink, the permissible levels of particulate matter and chemical impurities decrease dramatically-filters must retain ultrafine particles (single-digit nanometers) without introducing defects themselves. Existing filters suitable for older optical nodes may not meet the requirements of EUV/immersion processes.

US tariff policies and the Sino-US trade war could threaten the stability of the global semiconductor supply chain. The US has imposed a "tariff bar" on the global semiconductor industry, imposing high tariffs on chipmaking equipment and some chip products. This has led to soaring costs for companies across the global semiconductor supply chain. For example, US equipment manufacturers are facing revenue losses due to tariffs, and ASML of the Netherlands has also been affected, with orders falling short of expectations. Furthermore, the repeated tariff negotiations between the two sides of the Sino-US trade war have created uncertainty in the global semiconductor market.

Industry Development Opportunities:

The shift from disposable point-of-use filters to proven batch pre-filtration (to protect downstream distribution), larger-scale fab chemical systems, and centralized filtration systems are driving demand for pleated nylon filter cartridges and housings.

Smart Filtration Systems: Integrating IoT sensors into nylon filters enables real-time monitoring of differential pressure and particle counts, optimizing maintenance cycles. Nanofiber composites: Hybrid filters combining nylon with nanofibers (e.g., PES) enhance pore uniformity and mechanical strength, enabling filtration down to 0.02 μm for EUV applications.

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