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Emerging Driver to Reshape the Soft Chemical-Mechanical Polishing (CMP) Pad Market: Growing Semiconductor Industry Fueling The Growth Of The Market Due To Rising Demand For Advanced Electronics as a Key Influencer
Soft Chemical-Mechanical Polishing (CMP) Pad
How Large Will the Soft Chemical-Mechanical Polishing (CMP) Pad Market Size By 2025?
The market for soft chemical-mechanical polishing pads has seen substantial growth in the recent past. The market is set to expand from a value of $1.06 billion in 2024 to reach $1.15 billion in 2025, with a compound annual growth rate (CAGR) of 8.4%. The growth during the historical period is attributed to increased demand for sophisticated semiconductor nodes, burgeoning investment in foundry and memory fabs, the rising practice of using ultra-flat wafer surfaces in photonic and micro-electro-mechanical systems (MEMS) devices, as well as a growing emphasis on flawless polishing in advanced packaging.
How Big Is the Soft Chemical-Mechanical Polishing (CMP) Pad Market Size Expected to Grow by 2029?
Significant expansion is projected for the soft chemical-mechanical polishing pad market, with a size prediction of $1.57 billion by 2029, translating to a Compound Annual Growth Rate (CAGR) of 8.0%. This predicted rise during the forecast period can be traced back to the escalating demand in consumer electronics and automotive semiconductors, the increasing utilization of soft pads in the back end of line (BOEL) processes, the growing application of soft pads in logic device production, the burgeoning requirement for high-yield semiconductor manufacturing, and more and more usage of soft pads for uniform removal in ultra-low-k dielectric layers. The anticipated period will likely witness progress in soft pad surface texturing technology, a technological shift towards heterogeneous integration and chiplets, advancements in polyurethane and composite soft pad materials, technological novelties in hybrid slurry-pad compatibility, and innovative conditioning and regeneration methods for soft pads.
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Which Key Market Drivers Powering Soft Chemical-Mechanical Polishing (CMP) Pad Market Expansion and Growth?
The expansion of the semiconductor industry is catalyzing the market growth, spurred by an increasing demand for sophisticated electronics.
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What Are the Emerging Segments in the Soft Chemical-Mechanical Polishing (CMP) Pad Market?
The soft chemical-mechanical polishing (CMP) pad market covered in this report is segmented
1) By Type: Hard Pads, Soft Pads
2) By Material Type: Polyurethane, Silicon Carbide, Polyester, Composite Materials
3) By Application: Wafer Polishing, Film Chemical Mechanical Polishing, Memory Device Manufacturing, Photonic Device Manufacturing
4) By End-Use Industry: Electronics Industry, Automotive Industry, Aerospace Industry, Medical Devices Industry
Subsegments:
1) By Hard Pads: Polyurethane Pads, Diamond Conditioned Pads, Thermoplastic Pads, Molded Pads
2) By Soft Pads: Non-Woven Pads, Felt Pads, Porous Polymer Pads, Composite Pads
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Who Are the Global Leaders in the Soft Chemical-Mechanical Polishing (CMP) Pad Market?
Major companies operating in the soft chemical-mechanical polishing (cmp) pad market are 3M Company, DuPont De Nemours Inc., Cabot Corporation, Entegris Inc., SKC Co. Ltd., KPX Chemical Co. Ltd., Fujibo Holdings Inc., Hubei DingLong Chemical Co. Ltd., JSR Micro Inc., Beijing Grish Hitech Co. Ltd., Fraunhofer ISIT, FNS TECH Co. Ltd., Kemet International Ltd., Alfa Chemistry, Thomas West Inc., Spartan Felt Company Inc., Nitta Haas Inc., Pureon AG, and IV Technologies Inc.
Which are the Top Profitable Regional Markets for the Soft Chemical-Mechanical Polishing (CMP) Pad Industry?
Asia-Pacific was the largest region in the soft chemical-mechanical polishing (CMP) pad market in 2024. Asia-Pacific is expected to be the fastest-growing region in the forecast period. The regions covered in soft chemical-mechanical polishing (CMP) pad report are Asia-Pacific, Western Europe, Eastern Europe, North America, South America, Middle East and Africa.
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