Semiconductor Critical Dimension (CD) Metrology Systems Market Share Propelled by Advanced Node Production and Process Control Demands | Valuates Reports

Semiconductor Critical Dimension (CD) Metrology Systems Market
The global market for Semiconductor Critical Dimension (CD) Metrology Systems was valued at US$ million in the year 2024 and is projected to reach a revised size of US$ million by 2031, growing at a CAGR of %during the forecast period.

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The semiconductor critical dimension (CD) metrology systems market is experiencing strong momentum as chip manufacturers prioritize precision and process control in advanced semiconductor fabrication. The ongoing miniaturization of device structures and increasing complexity in patterning technologies are expanding the market size. Market trends show growing reliance on high-resolution metrology tools to ensure dimensional accuracy, reduce variability, and maintain yield across nodes as small as 5nm and below. This evolution is essential to support innovations in logic, memory, and power semiconductor devices, contributing to sustained market growth.

Among system types, CD-SEM systems hold the largest market share due to their unmatched resolution and precision in capturing sub-nanometer critical dimensions. These systems are extensively adopted in leading-edge fabs for inline process monitoring and defect analysis. On the other hand, optical critical dimension systems are witnessing the fastest market growth, driven by their ability to deliver high-throughput measurements in volume production environments while minimizing cost and tool footprint.

In terms of wafer size, 12-inch wafer applications dominate the market share, aligning with global trends toward larger wafers for increased production efficiency and lower cost per chip. The 8-inch wafer segment continues to be relevant for legacy nodes and specialty semiconductor manufacturing but shows slower growth. Other wafer sizes, including niche substrates, contribute marginally but serve specific process or R&D needs within the ecosystem.

Overall market growth is supported by the rising demand for high-performance computing, automotive electronics, and AI-driven devices, all of which require stringent control over CD variation. The future market forecast is expected to benefit from innovations in hybrid metrology, AI-enabled defect recognition, and increased integration of metrology within EUV and multi-patterning processes. These advancements are reinforcing the role of CD metrology systems as essential enablers in the era of next-generation semiconductor manufacturing.

by Type

• Optical Critical Dimension
• CD-SEM

by Application

• 8 Inch Wafer
• 12-Inch Wafer
• Others

By Company

KLA Corporation, Applied Materials, Hitachi High-Tech, NanoSystem Solutions, Onto Innovation, Camtek, Park System, ASML, ZEISS, Muetec, UnitySC, RSIC scientific instrument, Wuhan Jingce Electronic Group, Shenzhen Nanolighting Technology, Dongfang Jingyuan Electron, Suzhou Secote Precision Electronic, Shenzhen Angstrom Excellence Technology

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