Extreme Ultraviolet (EUV) Lithography Market is projected to reach USD 36.8 Billion by 2030, growing at a CAGR of 21.7% during the forecast period of 2023-2030 | published by MarketDigits

Extreme Ultraviolet (EUV) Lithography Market Scope:
Market size value in 2023 - USD 9.3 Billion
Market size value in 2030 - USD 36.8 Billion
CAGR (2023-2030) - 21.7%
Forecast Period - 2023-2030
Historic Data - 2019
Segments Covered - Equipment, Light Source, End use & Region
Geographies Covered - North America, Europe, Asia Pacific, and RoW
Sample of Companies Covered - NuFlare Technology, Energetiq Technology Inc., Photronics, Inc., HOYA Corporation, TRUMPF, Rigaku Corporation, Edmund Optics Ltd.

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Browse in-depth TOC on "Extreme Ultraviolet (EUV) Lithography Market"
178-Tables
95-Figures
332-Pages

Asia Pacific dominates the market for Extreme Ultraviolet (EUV) Lithography.
The Asia Pacific region emerges as the dominant region in the Augmented Reality (AR) Shopping market, underscoring its pivotal role in shaping the future of retail experiences. With a dynamic and tech-savvy consumer base, the region has witnessed a rapid adoption of AR technology in shopping, offering immersive and personalized experiences to consumers across various industries. Countries such as China, Japan, South Korea, and Taiwan are at the forefront of this trend, leveraging AR Shopping to enhance customer engagement and revolutionize the retail landscape. Moreover, the Asia Pacific region holds immense significance in the field of EUV (Extreme Ultraviolet) lithography, a cutting-edge technology crucial for semiconductor manufacturing. When examining the EUV lithography market in this region, these countries have emerged as key players, making substantial investments in the development and implementation of EUV lithography technology. State-of-the-art semiconductor fabrication facilities and research institutes in China, Japan, Taiwan, South Korea, and other parts of Asia Pacific are driving advancements in EUV lithography capabilities.

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Top Key Players Covered in the Report-
ASML, Carl Zeiss AG, TOPPAN Inc., NTT Advanced Technology Corporation, KLA Corporation, ADVANTEST CORPORATION, Ushio Inc., SUSS MicroTec SE, AGC Inc., Lasertec Corporation, NuFlare Technology, Energetiq Technology Inc., Photronics, Inc., HOYA Corporation, TRUMPF, Rigaku Corporation, Edmund Optics Ltd., Park Systems, Zygo Corporation, Imagine Optic, Applied Materials, Inc. and Others.

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Recent Developments-
In January 2022, ASML announced the last phase of collaboration with Intel Corporation to drive High- NA into manufacturing in 2025. The main objective is to advance the cutting edge of semiconductor lithography technology. The first purchase order issued by Intel Corporation to ASML for the delivery of the industry's first TWINSCAN EXE: 5200 system - an extreme ultraviolet (EUV) high-volume production system with a more than 200 wafers per hour productivity and huge numerical aperture and - as part of their long-term High-NA collaboration framework.

https://industrytoday.co.uk/market-research-industry-today/extreme-ultraviolet-euv-lithography-market-expected-to-reach-usd-368-billion-by-2030-with-217-cagr

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