Diverse Applications of the 172nm Excimer Lamp in the Semiconductor Industry

The continuous advancements in the semiconductor industry drive the development of light source technologies. The 172nm excimer lamp, with its unique spectral characteristics, has demonstrated significant potential in various critical stages of semiconductor manufacturing.

For over 20 years, GMY has been dedicated to the R&D and manufacturing of lighting technology applications, committed to providing cost-effective lighting technology solutions to our partners. In this article, we explore the applications of the 172nm excimer lamp in photocleaning, photocuring, hydrophilic modification, and TOC degradation in ultrapure water preparation.

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Photocleaning Applications

In semiconductor chip manufacturing, the cleanliness of the substrate surface directly impacts device performance. The deep ultraviolet light emitted by the 172nm excimer lamp effectively removes organic contaminants and particulates from the substrate surface, achieving high-precision optical cleaning.

Application Advantages:

High Cleaning Efficiency: The energy of deep ultraviolet photons is sufficient to break most chemical bonds, enabling rapid cleaning.

Residue-Free Cleaning: Avoids secondary contamination that could be caused by chemical cleaning agents.

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Photocuring Applications

Photopolymerization technology is also crucial in the semiconductor industry. The high-energy photons provided by the 172nm excimer lamp rapidly initiate the polymerization reaction of photosensitive materials, accelerating the curing process.

Application Advantages:

Rapid Curing: The 172nm excimer lamp emits high-energy deep ultraviolet light, helping shorten production cycles and enhance manufacturing efficiency.

Surface Curing: The high-energy radiation of 172nm UVC breaks molecular bonds, promoting cross-linking reactions between different monomers, achieving functional curing of material surfaces.

Hydrophilic Modification Applications

In addition to photocleaning and photopolymerization, the 172nm excimer lamp shows unique advantages in hydrophilic modification. Its ultraviolet energy modifies the surface of semiconductor device materials to enhance surface activity, improve wettability and adhesion, thereby enhancing overall device performance.

Application Advantages:

Improved Wettability: Reduces surface tension to enhance hydrophilicity, thereby improving wetting performance.

Increased Adhesion: Hydrophilic modification helps increase the adhesion between materials, which is particularly important for packaging processes.

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TOC Degradation Applications

In the preparation of ultrapure water, the 172nm excimer lamp plays a significant role. It effectively degrades total organic carbon (TOC) in the water, reducing TOC levels to the ppb range.

Application Advantages:

Efficient Degradation: The deep ultraviolet light effectively decomposes organic contaminants, reducing TOC content.

Ensuring Water Quality: Provides stable and reliable ultrapure water for semiconductor processes.

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The application of the 172nm excimer lamp in the semiconductor industry demonstrates its versatility and efficiency as a light source technology. From enhancing cleaning efficiency to improving material properties and ensuring water purity, the 172nm excimer lamp is becoming an indispensable tool in semiconductor manufacturing. As technology continues to advance, its application scope is expected to expand further, bringing more innovative possibilities to the semiconductor industry. We eagerly look forward to exploring the broader application potential of the 172nm excimer lamp in the industrial manufacturing sector with you.

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This release was published on openPR.