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Atomic Layer Deposition Global Market Report 2024 Market Size, Forecast, Trends, Growth, Scope By 2024-2033

Atomic Layer Deposition Global Market

Atomic Layer Deposition Global Market

The atomic layer deposition market size has grown strongly in recent years. It will grow from $2.74 billion in 2023 to $2.99 billion in 2024 at a compound annual growth rate (CAGR) of 8.9%. The growth in the historic period can be attributed to semiconductor industry growth, r&d investments, miniaturization trends, increasing applications, material innovation, global expansion.

The atomic layer deposition market size is expected to see strong growth in the next few years. It will grow to $4.17 billion in 2028 at a compound annual growth rate (CAGR) of 8.7%. The growth in the forecast period can be attributed to medical device innovations, ai and machine learning integration, energy storage solutions, strategic alliances and collaborations, regulatory support. Major trends in the forecast period include advancements in nanotechnology, focus on energy storage, global expansion of ald equipment manufacturers, emergence of new applicationsintegration of ald in 3d nand technology, technological innovations.

Market Overview -
Atomic layer deposition refers to a method for producing thin films with a variety of uses. ALD is a type of chemical vapour deposition (CVD) in which gaseous reactants (precursors) are introduced into the reaction chamber to create the desired material by chemical surface reactions.

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Growing Demand For Semiconductor Chips Drives The Market
Growing demand for semiconductor chips is expected to propel the growth of the atomic layer deposition market going forward. A semiconductor chip refers to an electric circuit with components including transistors and wiring formed on a semiconductor wafer. The manufacture of semiconductor chips and devices uses atomic layer deposition (ALD) to deposit layers of semiconductors on another semiconductor surface, therefore reducing or replacing the need for patterning stages. For instance, according to the Semiconductor Industry Association (SIA), a US-based trade association and lobbying group that represents the United States semiconductor industry, global semiconductor industry sales increased by 3.2 percent from $555.9 billion in 2021 to $573.5 billion in 2022. Therefore, the growing demand for semiconductor chips is driving the growth of the atomic layer deposition market.

Competitive Landscape -
Major companies operating in the atomic layer deposition market report are Arradiance LLC, ASM International N.V., Beneq Oy, Denton Vacuum LLC, Entegris Inc., Kurt J. Lesker Company, Lam Research Corporation., Oxford Instruments PLC, Tokyo Electron Limited, Veeco Instruments Inc., ALD NanoSolutions Inc., Forge Nano Inc., Adeka Corporation, Jiangsu Leadmicro Guide Nano Equipment Technology Co. Ltd., Encapsulix, NCD Co. Ltd., Applied Materials Inc., AIXTRON AG, EV Group, PVD Products Inc., Semilab Semiconductor Physics Laboratory Co. Ltd., KLA Corporation, Bruker Corporation, Hitachi High-Technologies Corporation, Nikon Corporation, Canon Inc., Toshiba Corporation, Sony Corporation, Panasonic Corporation, Moorfield Group Ltd. .

Product Innovation To Expand Application
Product innovation is the key trend gaining popularity in the atomic layer deposition market. Major players operating in the atomic layer deposition market are focusing on developing atomic layer deposition platforms for new applications. For instance, in October 2022, Samco Inc., a Japan-based manufacturer of semiconductor process equipment for the fabrication of electronic components and nano-scale devices, launched a new plasma-enhanced atomic layer deposition (PEALD) system, AD-800LP. The system's primary objective is to depose gate oxide films for the next generation of silicon carbide (SiC) and gallium nitride (GaN) power devices, which will be crucial in the transition to carbon neutrality. In addition to the traditional thermal ALD capability, the plasma-enhanced ALD system AD-800LP is a multi-purpose R&D system outfitted with a particular ICP plasma source named Tornado ICP. Tornado ICP, a Samco-exclusive plasma technology that differs from distant plasma, permits the deposition of diverse films using the AD-800LP, including oxide and nitride films. Tornado ICP allows steady plasma discharge for ALD deposition even at high pressures.

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Key Segments -

The atomic layer deposition market covered in this report is segmented -

1) By Type: Metal ALD, Aluminum oxide ALD, Plasma Enhanced ALD, Catalytic ALD, Other Types
2) By Process: Chemical Vapor Deposition (CVD), Physical Vapor Deposition (PVD)
3) By End User: Semiconductors And Electronics, Chemicals, Energy, Healthcare, Other End Users

Key highlights covered in the report -
1. Detailed market size forecast and historical data analysis
2. Key drivers influencing market growth
3. Identification of upcoming trends and potential opportunities in the market
4. Analysis of major players strategies, to understand competitive dynamics and market positioning
5. Evaluation of regional dynamics

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"Contact Us:
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Americas: +1 315 623 0293
Email: info@tbrc.info

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"Want To Know More About The Business Research Company?

The Business Research Company (www.thebusinessresearchcompany.com) is a market intelligence firm that pioneers in company, market, and consumer research. Located globally, TBRC's consultants specialise in various industries including manufacturing, healthcare, financial services, chemicals, and technology.

Global Market Model - World's Most Comprehensive Database

The Business Research Company's flagship product, Global Market Model (www.thebusinessresearchcompany.com/global-market-model) is a market intelligence platform covering various macroeconomic indicators and metrics across 60 geographies and 27 industries. The Global Market Model covers multi-layered datasets which help its users assess supply-demand gaps"

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