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Gas Scrubbers for Semiconductor Market: Size, Share, Growth, Analysis, Key Players, Revenue, Growth | Valuates Reports
Gas Scrubbers for Semiconductor Market SizeAccording to new survey, global Gas Scrubbers for Semiconductor market is projected to reach US$ 3534.9 million in 2029, increasing from US$ 1286.7 million in 2022, with the CAGR of 15.9% during the period of 2023 to 2029.
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Gas Scrubbers for Semiconductor Market
Burn Wet Type is a system that maximizes CO and Nox treatment efficiency through multi-stage combustion by passing the gas generated after use in the semiconductor process directly through the flame. Plasma Wet Type is a system that treats generated gas at a high temperature of 2000 °C or higher using DC Arc Jet Plasma in semiconductor, LCD, LED, OLED, and SOLAR processes. Wet Type is a system that treats water-soluble gas and dust through a high-pressure water pump and fine spray of water. Dry type is a system that treats harmful gases below TLV through physical and chemical adsorption as harmful gases pass through the adsorbent filling tank.
Global key manufacturers of Gas Scrubbers for Semiconductor include Ebara Corporation, Global Standard Technology, and UNISEM. The top five manufacturers account for approximately 50% of the global share. Global origins are mainly located in North America, Europe, China, Japan and South Korea, with South Korea being the world's largest producer of semiconductor gas scrubbers, with a share of about 50%. In terms of product type, plasma scrubbers are the largest segment with about 39% share, while in terms of application, CVD (SiH4, TEOS, DCS, NH3, ClF3, B2H6, etc.) is the largest downstream segment with about 30%.
Report Scope
This report, based on historical analysis (2018-2022) and forecast calculation (2023-2029), aims to help readers to get a comprehensive understanding of global Gas Scrubbers for Semiconductor market with multiple angles, which provides sufficient supports to readers' strategy and decision making.
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Segment by Type
• Burn Scrubber
• Plasma Scrubber
• Heat Wet Scrubber
• Dry Scrubber
Segment by Application
• CVD (SiH4, NF3, WF6, B2H6, TEOS, TDMAT, N2O, C3H6, Etc.)
• Diffusion (SiH4, TEOS, DCS, NH3, ClF3, B2H6, Etc.)
• Etch (CF4, SF6, BCl3, Cl2, HBr, Etc.)
• Others
By Company
Ebara, Global Standard Technology, CSK, Unisem, Edwards Vacuum, Kanken Techno, EcoSys, GNBS Engineering, DAS Environmental Expert GmbH, CS Clean Solution, YOUNGJIN IND, Integrated Plasma Inc (IPI), Shengjian, MAT Plus, KC Innovation, Triple Cores Technology, Japan Pionics
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