Press release
Global Aluminum Sputtering Target Market Research Report 2023
Global Aluminum Sputtering Target MarketAluminum Sputtering Target is a material that is used to create thin films in a technique known as sputter deposition, or thin film deposition.
The global Aluminum Sputtering Target market was valued at US$ million in 2022 and is anticipated to reach US$ million by 2029, witnessing a CAGR of % during the forecast period 2023-2029. The influence of COVID-19 and the Russia-Ukraine War were considered while estimating market sizes.
North American market for Aluminum Sputtering Target is estimated to increase from $ million in 2023 to reach $ million by 2029, at a CAGR of % during the forecast period of 2023 through 2029.
Asia-Pacific market for Aluminum Sputtering Target is estimated to increase from $ million in 2023 to reach $ million by 2029, at a CAGR of % during the forecast period of 2023 through 2029.
The key global companies of Aluminum Sputtering Target include JX Nippon Mining & Metals Corporation, Praxair, Plansee SE, Mitsui Mining & Smelting, Hitachi Metals, Honeywell, Sumitomo Chemical, ULVAC and Materion (Heraeus), etc. In 2022, the world's top three vendors accounted for approximately % of the revenue.
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Report Scope
This report aims to provide a comprehensive presentation of the global market for Aluminum Sputtering Target, with both quantitative and qualitative analysis, to help readers develop business/growth strategies, assess the market competitive situation, analyze their position in the current marketplace, and make informed business decisions regarding Aluminum Sputtering Target.
The Aluminum Sputtering Target market size, estimations, and forecasts are provided in terms of output/shipments (K Units) and revenue ($ millions), considering 2022 as the base year, with history and forecast data for the period from 2018 to 2029. This report segments the global Aluminum Sputtering Target market comprehensively. Regional market sizes, concerning products by type, by application and by players, are also provided.
For a more in-depth understanding of the market, the report provides profiles of the competitive landscape, key competitors, and their respective market ranks. The report also discusses technological trends and new product developments.
The report will help the Aluminum Sputtering Target manufacturers, new entrants, and industry chain related companies in this market with information on the revenues, production, and average price for the overall market and the sub-segments across the different segments, by company, by type, by application, and by regions.
Key Segmentations
By Company
JX Nippon Mining & Metals Corporation
Praxair
Plansee SE
Mitsui Mining & Smelting
Hitachi Metals
Honeywell
Sumitomo Chemical
ULVAC
Materion (Heraeus)
GRIKIN Advanced Material Co., Ltd.
TOSOH
Ningbo Jiangfeng
Heesung
Luvata
Fujian Acetron New Materials Co., Ltd
Changzhou Sujing Electronic Material
Luoyang Sifon Electronic Materials
FURAYA Metals Co., Ltd
Advantec
Angstrom Sciences
Umicore Thin Film Products
Segment by Type
Low Purity Aluminum Sputtering Target
High Purity Aluminum Sputtering Target
Ultra High Purity Aluminum Sputtering Target
Segment by Application
Semiconductors
Solar Cell
Flat Panel Display
Others
Production by Region
North America
Europe
China
Japan
South Korea
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Consumption by Region
North America
U.S.
Canada
Europe
Germany
France
U.K.
Italy
Russia
Asia-Pacific
China
Japan
South Korea
Taiwan
Southeast Asia
India
Latin America
Mexico
Brazil
SIMILAR REPORTS
https://reports.valuates.com/market-reports/QYRE-Auto-11I15590/global-titanium-aluminum-sputtering-targets
https://reports.valuates.com/market-reports/QYRE-Auto-26P12248/global-fluoride-ceramic
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