Photoresist and Photoresist Ancillaries Market Report, Value, Volume, Growth Drivers and Forecast 2021-2026

As per the latest report by IMARC Group, titled "Photoresist and Photoresist Ancillaries Market: Global Industry Trends, Share, Size, Growth, Opportunity and Forecast 2021-2026", offers a comprehensive analysis of the industry, which comprises insights on Photoresist and Photoresist Ancillaries market. The report also includes competitor and regional analysis, and contemporary advancements in the global market. The global photoresist and photoresist ancillaries market reached a value of US$ 3.88 Billion in 2020. Looking forward, IMARC Group expects the market to exhibit moderate growth during 2021-2026.

A photoresist is a natural polymer that improves its biochemical structure when exposed to ultraviolet light. Photoresist ancillaries act as masking materials for the transfer of images into an underlying substrate via etching processes. They are categorized into three categories based on their chemical structure, including photo polymeric, photo decomposing, and photo crosslinking photoresists. They include materials, such as photoresist strippers, anti-reflective coatings, developers, and edge bead removers that are used in the wiring configuration of multi-layered semiconductors that are utilized in the manufacturing of computers, laptops, music players, phones, servers, and household appliances. They are also used in the production of printed circuit boards, flat panel liquid crystal displays, magnetic recording heads, and microelectromechanical systems (MEMS).

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Market Trends:

The rising demand for electronic products among the masses is driving the global market. Moreover, continuous technological advancements in display technology and growth in the semiconductor industry are further catalyzing the demand across the globe. Additionally, the increasing deployment of photoresist ancillaries in various industries, on account of their lighter, thinner, and energy-efficient properties, is supporting the overall demand. Furthermore, several major companies are heavily investing in developing new production facilities to meet the increased demand is creating a positive market outlook. Other factors, including rapid industrialization, the growing production of nm-based chips and the emergence of AI and big data, are projected to propel the market further.

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Competitive Landscape:

The competitive landscape of the market has been studied in the report with the detailed profiles of the key players operating in the market.

• Tokyo Ohka Kogyo Co., Ltd.
• JSR Corporation
• DowDuPont
• Shin-Etsu Chemical Co. Ltd.
• Fujifilm Electronics Materials Co., Ltd.
• Sumitomo Chemical Co., Ltd.
• Merck Az Electronics Materials
• Allresist GmbH
• Avantor Performance Materials, LLC
• Microchemicals GmbH

Photoresist and Photoresist Ancillaries Market Segmentation:

Our report has categorized the market based on region, type and application.

Breakup by Type:
• KrF
• ArF dry
• ArF immersion
• g- and i-line

Breakup by Application:
• Semiconductors
• Integrated Compound Semiconductors (ICS)
• Liquid Crystal Display (LCD)
• Printed circuit boards
• Others

Breakup by Region:
• North America (United States, Canada)
• Europe (Germany, France, United Kingdom, Italy, Spain, Others)
• Asia Pacific (China, Japan, India, Australia, Indonesia, Korea, Others)
• Latin America (Brazil, Mexico, Others)
• Middle East and Africa (United Arab Emirates, Saudi Arabia, Qatar, Iraq, Other)

Key highlights of the report:
• Market Performance
• Market Outlook
• Porter's Five Forces Analysis
• Market Drivers and Success Factors
• SWOT Analysis
• Value Chain
• Comprehensive Mapping of the Competitive Landscape

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