EUV Lithography Market Demand, Growth, Size, Review, Share, Analysis to 2029

Market Overview
The Global EUV Lithography Market is expected to grow at a CAGR of 12% during the forecasting period (2022-2029).

Extreme ultraviolet is a next-generation lithography technology using a range of extreme ultraviolet (EUV) wavelengths, roughly spanning a 2% FWHM bandwidth of about 13.5 nm. Majorly rising global demand for smartphones is will drive the market for EUV lithography over the forecast period.

Extreme ultraviolet lithography (EUVL) is an advanced technology for making Microprocessors a hundred times more powerful than traditional ones. EUVL is like optical lithography in which light is refracted through camera lenses onto the wafer.
However, extreme ultraviolet light, operating at a different wavelength, has different properties and must be reflected from mirrors rather than refracted through lenses. The challenge is to build mirrors perfect enough to reflect the light with enough precision.

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Market Dynamics:
The global EUV Lithography market is primarily driven by the trend of miniaturization. Lithography is used to print complex patterns that define integrated circuits onto semiconductor wafers. EUV lithography (EUVL) is one of the leading next-generation lithography (NGL) technologies. Using EUVL, it is easy to get compact electronic chips with less power requirements. The technology features enhanced resolving power and is cost-effective.

Together these structures form an integrated circuit known as a chip. The unrelenting drive of the semiconductor industry for ever more powerful microchips means that chipmakers must pack even more structures onto a chip, thereby making the chip faster and more powerful while simultaneously lowering the production costs.
With this finer resolution, chipmakers are now capable of producing smaller, faster and more powerful chips, while the complexity of the manufacturing process and the costs stay within the framework.

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Market Segmentation:
By Light Source
• Laser Produced Plasma (LPP)
• Vacuum Sparks
• Gas Discharges
By Application
• Integrated Device Manufacturer (IDM)
• Foundry
By Equipment
• Light Source
• Mirrors
• Masks

Major Companies:
The major players include ASML, Canon Inc., Intel Corporation, Nikon Corporation, NuFlare Technology Inc., Samsung Corporation, SUSS Microtec AG, Taiwan semiconductor Manufacturing Company Limited (TSMC), Ultratech Inc., Vistec Semiconductor Systems, and among others.

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