Press release
Sputtering Target Market to Surpass Valuation of US$ 6.77 Bn by 2031 with Rise in Adoption of Advanced Technology
The global sputtering target market is broadly affected by several factors, including increase in the adoption of sputtering target in solar panels.
๐ ๐จ๐ซ ๐๐ฑ๐ญ๐๐ง๐ฌ๐ข๐ฏ๐ ๐๐ง๐ฌ๐ข๐ ๐ก๐ญ๐ฌ- https://www.transparencymarketresearch.com/sputtering-target-market.html
Sputtering Target Market: Dynamics
Sputtering target is a new type of coating material (compared to evaporation materials) that is critical for thin-film solar cell coatings in the solar industry.
A thin-film solar cell is a second-generation solar cell that is made by depositing one or more thin layers, or thin-film (TF) of photovoltaic material on a substrate, such as glass, plastic, or metal. Sputtering targets are important source materials in the deposition process. CdTe (cadmium telluride) sputtering target, CIGS (copper indium gallium diselenide) sputtering target, and silicon sputtering target are used in the solar cell thin-film coating.
According to SEIA (Solar Energy Industries Association) in the U.S., in the last decade alone, solar has experienced an average annual growth rate of 42%. Presently, more than 97 gigawatts (GW) of solar capacity is present due to strong federal policies such as the Solar Investment Tax Credit, rapidly declining costs, and increasing demand across the private and public sector for clean electricity. This, in turn, is boosting the adoption of sputtering target in coating solar cells.
๐๐จ๐ฐ๐ง๐ฅ๐จ๐๐ ๐๐๐ ๐๐ซ๐จ๐๐ก๐ฎ๐ซ๐- https://www.transparencymarketresearch.com/sample/sample.php?flag=S&rep_id=63036
Sputtering Target Market: Prominent Regions
The sputtering target market in Asia Pacific is expected to expand during the forecast period, owing to the presence of key market players, technological advancements, and expansion of the semiconductor and automotive sectors in the region. The sputtering target market in Asia Pacific is projected to expand further due to significant rise in the demand for consumer electronics devices. Furthermore, innovations in the field of electronics and increase in rate of adoption of advanced technology are projected to fuel the Asia Pacific market to cross value of US$ 3.59 Bn by 2031. The sputtering target market in North America is likely to expand at a notable CAGR of 4.9% during the forecast period, owing to the presence of significant number of players manufacturing sputtering targets in the region.
๐๐๐ค๐ ๐๐ง ๐๐ง๐ช๐ฎ๐ข๐ซ๐ฒ ๐๐๐๐จ๐ซ๐ ๐๐ฎ๐ฒ๐ข๐ง๐ - https://www.transparencymarketresearch.com/sample/sample.php?flag=EB&rep_id=63036
Sputtering Target Market: Key Players
Key players operating in the global sputtering target market are Honeywell International, Inc., Heraeus Holding GmbH, Hitachi Metals, JX Nippon Mining & Metals Corporation, Kamis Incorporated, Konfoong Materials International Co., Ltd., Buhler Leybold Optics, Matsurf Technologies Inc., Mitsubishi Corporation, Praxair International, Inc., Sumitomo Chemicals Co., Ltd., Testbourne Ltd., Tosoh Corporation, ULVAC, Inc., and Vacuum Engineering and Materials Co.
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In the SELCOS Inline sputtering system, the process is fully automated to ensure stable quality and provides a wide range of expandability by its various applicable technologies. Its high mobility maximizesthe productivity. It is widely used for the various thin film processes such as metal, oxide and TCO. Also itโฆ
