North America Photoresist and Photoresist Ancillaries Market is projected to reach US$ 1,128.5 million and Growing at a CAGR of 6% during forecast period 2022-2027

The North Americaphotoresist and photoresist ancillaries market was valued at US$ 666.7 million in 2018 and is projected to reach US$ 1,128.5 million by 2027; it is expected to grow at a CAGR of 6.0% during the forecast period. Factors driving the market growth include the growth in the semiconductor industry and increasing demandfor photoresist and photoresist ancillaries from various applications. However, the regulations by various agencies upon the use of raw materials in photoresist ancillaryproducts is likely to have a negative impact on market growth.

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Key companies profiled in this research study are:
MERCK KGaA
Sumitomo Chemical Co., Ltd.
TOKYO OHKA KOGYO CO., LTD
Micro Resist Technology GmbH
Shin-Etsu Chemical Co., Ltd
DJ Microlaminates, Inc.
DuPont de Nemours, Inc.
Fujifilm Corporation
JSR Corporation

Photoresists are light-sensitive polymeric resins mainly used in the production of printed circuit boards, printing plates, flat-panel liquid crystal displays, magnetic recording heads, and micro electromechanical systems (MEMS). These components serve as masking materials for the transfer of images into an underlying substrate via etching processes. Photoresist ancillaries are materials such as photoresist strippers, anti-reflective coatings, developers, and edge bead removers used along with photoresist.The photoresists and photoresist ancillaries are used in wiring configuration of multi-layered semiconductors used in the manufacturing computers, laptops, music players, phones, servers, and household appliances.

The electronic industry is witnessing steady growth in developed and developing countries. The companies operating in this field use photoresist and photoresist ancillaries in products such as advanced telephones, computer systems, and related accessories, televisions and home entertainment equipment, and electronic control and monitoring devices, which have applications in many industrial and scientific areas.

Key Market Segments:
By photoresist type, the ArF immersion photoresist segment accounted for the largest share ofthe North Americaphotoresist and photoresist ancillariesmarket in 2018. In terms of photoresist ancillaries, the anti-reflective coatingssegment held the largest share of the photoresist and photoresist ancillariesmarket in 2018. In terms of application, in 2018, the semiconductors & ICssegment held the most significant market share of the photoresist and photoresist ancillariesmarket in North America.

North AmericaPhotoresist and Photoresist AncillariesMarket Segmentation:

By Photoresist Type
ArF Immersion Photoresist
ArF Dry Photoresist
KrF Photoresist
G-line and I-line Photoresist

By Photoresist Ancillaries Type
Anti-reflective Coatings
Remover
Developer
Others

By Application
Semiconductors and ICs
LCDs
Printed Circuit Boards
Others

By Country
US
Canada
Mexico

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Major Features of North America Photoresist and Photoresist Ancillaries Market Report:
Save and reduce time carrying out entry-level research by identifying the growth, size, leading players and segments in the North America Photoresist and Photoresist Ancillaries Market.
Highlights key business priorities in order to assist companies to realign their business strategies.
The key findings and recommendations highlight crucial progressive industry trends in the North America Photoresist and Photoresist Ancillaries Market, thereby allowing players across the value chain to develop effective long-term strategies.
Develop/modify business expansion plans by using substantial growth offering developed and emerging markets.
Scrutinize in-depth North America market trends and outlook coupled with the factors driving the market, as well as those hindering it.
Enhance the decision-making process by understanding the strategies that underpin commercial interest with respect to client products, segmentation, pricing and distribution

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