High-K And ALD/CVD Metal Precursor Market Growth Trend, Industry Outlook and Forecast 2024 | TMI, Air Products & Chemicals, Dow Chemical, Air Liquide, UPChem, Adeka

High-k and ALD/CVD metal precursor market is experiencing an upswing in its growth curve with more number of players focusing on cost effective solutions. Hybrid organic and inorganic thin films are gaining popularity owing to its comparatively lower manufacturing costs and lucrative properties. Furthermore, strict regulatory measures undertaken by various governments regarding IPR protection is bringing the focus of the manufacturers on the chemical designing of semiconductors. A seamless, easy, cost effective fabrication of semiconductors require a more complexed three-dimensional structure, for which atomic layer and chemical vapor deposition process are highly adopted.

Mechanical, optical, dielectric, conductive, and chemical properties of hybrid organic or inorganic films are expected to stimulate the high-k metal precursor market growth in the forthcoming years. Surging demand for various thin-film materials across industrial applications would lead towards technological advancement and innovation, which in return could support industry growth.

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In terms of regional landscape of High-k and ALD/CVD metal precursor market, Asia Pacific is one of the dominating players in the global scenario. China being the major revenue pocket for APAC market, held a 35% of the total revenue share in 2015. Driven by the growing end-use electronics product demand of the region, China High-k and ALD/CVD metal precursor industry is anticipated to continue its dominance in the regional market. As per the estimates, Taiwan holds the largest consumer base of advanced semiconductor materials, which in turn is projected to have a parallel impact on the region’s High-k and ALD/CVD metal precursor market.

Based on metal precursor technology, the market is segmented into gates, interconnect, and capacitors. Interconnect High-k and ALD/CVD metal precursor market dominated the global demand in 2015 with an industry coverage of 45% of the total volume. With the evolution of power electronics incorporated with nonplanar transistors, nonvolatile memory chips, interconnect technology is in high demand. This segment dominated the technology landscape in 2015 accounting for 45% of the global demand. High-k gate precursor industry also had a considerable share of the global revenue in 2015 having collected a revenue of USD 33 million in 2015.

Meanwhile, U.S. high-k and ALD/CVD metal precursor market surpassed USD 30 million in 2015. Complications in semiconductor manufacturing together with transition and scaling to 450 mm wafers processing would support the regional nanotechnology and microelectronics sector, which would generate lucrative opportunities for the regional market.

Mergers and acquisitions along with competitive pricing remain the major business strategies adopted by the key market players. Some of the prominent participants operating in. high-k and ALD/CVD metal precursor market include Dow Chemical, Air Liquide, UP Chemical, and Adeka.

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Partial Chapter of the Table of Content
Chapter 4 High-k and ALD/CVD Metal Precursor Technology Insights
4.1 High-k and ALD/CVD metal precursor market share by technology, 2015 & 2024
4.2 Interconnect
4.2.1 Market estimates by region, 2013 - 2024
4.3 Memory/Capacitor
4.3.1 Market estimates by region, 2013 - 2024
4.4 Gates
4.4.1 Market estimates by region, 2013 - 2024

Charts & Figures
FIG. 1 High-k and ALD/CVD metal precursors market segmentation
FIG. 2 Global high-k and ALD/CVD metal precursors market, (USD Million), 2013 - 2024
FIG. 3 High-k and ALD/CVD metal precursors industry ecosystem analysis
FIG. 4 Industry Impact forces
FIG. 5 Growth potential analysis
FIG. 6 Porter’s analysis
FIG. 7 PESTEL analysis
FIG. 8 High-k and ALD/CVD metal precursors market by technology, 2015 & 2024
FIG. 9 Global high-k interconnect demand (USD Million), 2013 - 2024
FIG. 10 Global high-k capacitors demand (USD Million), 2013 - 2024

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