Photomask Market - Rapid Growth at Deep Value Price from 2020-2026

Photomasks are high-purity quartz or glass plates that contain a pattern of ICs. These are used in the reproduction of pattern structures for manufacturing printed circuit boards, electronic circuits, and LCD displays, and for the serial production of reticles and other microstructures.
Photomasks are used at wavelengths of 365 nm, 248 nm, and 193 nm. ICs are manufactured layer by layer, where each layer requires a unique photomask. As current generation ICs typically have 25-60 layers, the manufacturing process of photomasks has become complex.

Photomask, also known as photomask, photomask, lithography mask, reticle, etc., is a graphic "negative" in the manufacturing process of downstream industries, and is the bearing of intellectual property information such as graphic design and process technology. a. In the lithography process, the mask is the carrier of the design graphics. Through photolithography, the design pattern on the mask plate is transferred to the photoresist, and then the pattern is etched onto the substrate to achieve the transfer of the pattern to the silicon wafer. The mask is an important part in the lithography process, and its performance has an important influence on the lithography.

The structure of the photomask is shown in the figure below, and its glass material can be selected according to different requirements. At present, with the advancement of process technology, quartz glass with low thermal expansion coefficient, low sodium content, high chemical stability and high light penetration characteristics is the mainstream, and an opaque chromium film with a thickness of about 100 nm is coated on it as As a layer and about 20nm of chromium oxide to reduce light reflection and increase the stability of the process.

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The reason why the photomask can be used as a template for pattern transfer is that there is no chromium film. Where there is a chromium film, the light cannot penetrate, otherwise, the light can be irradiated through the quartz glass and coated with photoresist On the wafer, the wafer can be developed to produce different patterns. It is precisely because the photomask plate can be used for a large number of pattern transfers, so the defect density on the photomask plate will directly affect the excellent product rate of the product.

From the perspective of manufacturers, the current global mask plate manufacturers are mainly concentrated in several giants in Japan and the United States, including Japan Toppan Printing, Nippon Printing Co., Ltd., Photronics, Hoya, SK Electronics, etc. Among them, Photronics, Nippon Printing Co., Ltd. DNP and Japan Toppan Printing Co., Ltd. Toppan accounted for more than 80% of the global mask plate market share. In addition, wafer fabs will also provide self-made masks in-house. For example, Intel, TSMC, Samsung, etc. all have self-made masks.

Photomask Classification
Segment by Type, the Photomask market is segmented into
Quartz Mask
Soda Mask
Toppan
Film

In addition to material classification, semiconductor photomasks can also be classified according to size, the following table is the common size of semiconductor photomasks
Since the COVID-19 virus outbreak in December 2019, the disease has spread to almost 100 countries around the globe with the World Health Organization declaring it a public health emergency. The global impacts of the coronavirus disease 2019 (COVID-19) are already starting to be felt and will significantly affect the Photomask market in 2020.

COVID-19 can affect the global economy in three main ways: by directly affecting production and demand, by creating supply chain and market disruption, and by its financial impact on firms and financial markets.

The outbreak of COVID-19 has brought effects on many aspects, like flight cancellations; travel bans and quarantines; restaurants closed; all indoor events restricted; over forty countries state of emergency declared; massive slowing of the supply chain; stock market volatility; falling business confidence, growing panic among the population, and uncertainty about future.

This report also analyses the impact of Coronavirus COVID-19 on the Photomask industry.
Based on our recent survey, we have several different scenarios about the Photomask YoY growth rate for 2020. The probable scenario is expected to grow by a xx% in 2020 and the revenue will be xx in 2020 from US$ xx million in 2019. The market size of Photomask will reach US$ xx in 2026, with a CAGR of xx% from 2020 to 2026.

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At present, the outbreak of new coronary pneumonia is spreading all over the world. Countries such as Europe, the United States, Japan, and South Korea are undergoing the test of the outbreak, while China has been under the strong control of the country, and the epidemic has been initially controlled. The outbreak of the global epidemic will have a certain impact on the pattern of the semiconductor industry, especially the intensification of the epidemic in Japan, Europe and the United States will affect the supply of semiconductor materials. The Chinese epidemic situation has been well controlled, and in some sub-sectors of semiconductor materials, Chinese companies have achieved partial Chinese substitution. China has a first-mover advantage in supply, and Chinese semiconductor materials companies will usher in a golden development period.

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This release was published on openPR.