Dry Film Photoresist Market Checkout the Unexpected Future 2026 | Key Players Asahi Kasei, TOKYO OHKA KOGYO CO., LTD., JSR Corporation, The Dow Chemical Company

The Dry Film Photoresist Market is forecast to grow from USD 4.01 billion in 2018 to USD 5.14 billion by 2026, at a CAGR of 3.1 %, during the forecast period. Advancements in technology which is increasing the utilization of Nano devices is the major driving factor of the market. The Dry Film Photoresist Market is forecast to show significant growth due to the increase in implementation photo-resist technology and growing demand of the technology in the IC's and semiconductor markets. The rising need for Nano devices is helping the market.

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Companies considered and profiled in this market study

Some of the major key players in the photoresist market are Asahi Kasei (Japan), TOKYO OHKA KOGYO CO., LTD. (Japan), JSR Corporation (Japan), The Dow Chemical Company (U.S.), Fuji film Electronics Material Co., Ltd. (Japan), Shin-Etsu Chemical Co., Ltd. (Japan), Sumitomo Chemicals Co., LTD. (Japan), HITACHI Chemical (Japan) , GREAT EASTERN RESINS INDUSTRIAL CO., LTD. (Taiwan) and AZ Electronic Materials (Luxembourg)

A photoresist is a light-sensitive material used in the process of photoengraving or photolithography which is applied to a surface to produce the desired pattern to be imaged. It is used in semiconductors & ICs, printed circuit boards, LCDs and others application. The applications of the photoresist technology is driving the market worldwide.

For the purpose of this report, the market has been segmented on the basis of Category, Type, Implementation and region:

Category Outlook (Revenue, USD Million; 2018-2026)
G-line
I-line
ArF immersion
KrF
ArF dry

Type Outlook (Revenue, USD Million; 2018-2026)
Remover
Anti-reflective coating
Developer

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Implementation Outlook (Revenue, USD Million; 2018-2026)
Semiconductor &Ic's
LCD's
Printed circuit board

Regional Outlook (Revenue, USD Million; 2018-2026)
North America
Europe
Asia Pacific
Latin America
MEA

Further key findings from the report suggest

1. The Dry Film Photoresist Market is forecast to grow from USD 4.01 billion in 2018 to USD 5.14 billion by 2026, at a CAGR of 3.1 %, during the forecast period. Advancements in technology which is increasing the utilization of Nano devices is the major driving factor of the market.

2. Based on Category, the market is divided as ArF immersion, I-line, G-line, ArF, KrF. The ArF immersion sector of the photoresist market is estimated to grow at the highest CAGR of 3% during the forecast period. ArF immersion has superior properties like low defects, high resolution and narrow wavelength. It also prevents the requirement for other techniques like strong resolution enhancement.

3. Based on Types, the market is segmented as remover, anti-reflective coatings and developer. Anti-reflection (AR) coating is a kind of optical coating used in the surface of optical elements to reduce reflection. since less light is lost due to reflection, this improves the efficiency

4. The Implementation types are Semiconductor and IC's, Printed circuit boards and LCD's. The ICs application & semiconductors sector is estimated for the largest share of 33% of the global photoresist market. This sector is estimated to continue to dominate during the forecast period.

5. The Dry Film Photoresist Market is segmented across five regions, namely, North America, Asia-Pacific (APAC), Europe, the Middle East and Africa (MEA), and Latin America. APAC is forecasted to dominate the market with a highest share of 34 % in 2018.

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3. The market intelligence report derives an eight-year forecast, including historical, contemporary, and potential market prospects, projecting the estimated progress of the market.

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