Photoresist & Photoresist Ancillaries Market | Key players operating in the market include Tokyo Ohka Kogyo Co. Ltd, JSR Corporation, DuPont, Shin-Etsu Chemical Co. Ltd, Fujifilm Corporation

According to recent market research "Photoresist & Photoresist Ancillaries Market by Application(Semiconductor & IC, LCD, PCB), Photoresist Type (ArF Immersion, ArF Dry Film, KrF, G-Line & I-line), Ancillaries Type(Anti-reflective coating, Remover, Developer),and Region-Global Forecast to 2024", photoresist and photoresist ancillaries market size is estimated to be USD 3.3 billion in 2019 and projected to reach USD 4.5 billion, by 2024, at a CAGR of 6.1%.

The growing demand for wearable devices, smartphones, tablets, and other smart appliances is expected to boost the photoresist and photoresist ancillaries market. The major restraining factor in the photoresist market is that it is an expensive and time-consuming process. The process requires specialty equipment, which is expensive. The restraining factors associated with the particular market are limited consumption in the emerging economies and taxation policies linked to particular products.

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A photoresist is a light-sensitive material, which is applied to a substrate during photolithography or photoengraving, to enable the desired pattern to be imaged. A properly exposed and developed photoresist masks portions of the substrate with extremely high precision.

In a positive resist, the portion of the photoresist that is exposed to light becomes soluble in the photoresist developer. The unexposed portion of the photoresist remains insoluble in the photoresist developer. A negative photoresist is a type of photoresist in which the portion that is exposed to light becomes insoluble in the photoresist developer. The unexposed portion of the photoresist is dissolved by the photoresist developer.

Photoresist consists of resin or polymer, solvent, and a photosensitizer. The process of using photoresist in designing circuits is known as photolithography, which is one of the patterning methods of semiconductor fabrication. Photoresist can be broadly classified into ArF, KrF, I-line, and G-line, based on their response to a specific wavelength of light. These materials are sensitive to wavelengths 193 nm (ArF), 248 nm (KrF), 365 nm (I-line), and 436 nm (G-line). ArF and KrF types of photoresists are used in nanometer level processing, while G-line and I-line are used for sub-micron level processing. ArF photoresist is the most widely used photoresist as it provides superior resolution with low defect levels, owing to its narrow wavelength and ability to break through a 10 nm level.

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The photoresist and photoresist ancillaries market size is estimated to be USD 3.3 billion in 2019 and projected to reach USD 4.5 billion by 2024, at a CAGR of 6.1%. A photoresist is a light-sensitive material which applied to a substrate during photolithography or photoengraving, to enable the desired pattern to be imaged. A properly exposed and developed photoresist masks portions of the substrate with extremely high precision. The growing semiconductor industry in Asia-pacific is expected to drive the Photoresist and Photoresist ancillaries market.

The innovations in semiconductors & ICs are always focused on providing faster, smaller, and less energy-consuming circuit developments. The photoresist market is also driven by the rising demand for high-resolution LCD screens, flexible Printed circuit boards, and high added-value consumer electronics devices. Growth in the semiconductor industry and dynamic flat panel display technology trends are expected to be the major driving factors for the growth of the photoresist and photoresist ancillaries market. The upcoming nanoelectromechanical systems (NEMS) are anticipated to provide opportunities for players in the photoresist and photoresist ancillaries industry.

The leading players in the global Photoresist and Photoresist ancillaries market includes Tokyo Ohka Kogyo Co., Ltd (Japan), JSR Corporation (Japan), DuPont (US), Shin-Etsu Chemical Co., Ltd (Japan), Fujifilm Corporation (Japan), Sumitomo Chemical Co., Ltd. (Japan), ALLRESIST (Germany), Merck Group (Germany), Micro Resist Technology (Germany), and DJ MicroLaminates (US).

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JSR Corporation (Japan) is one of the largest rubber and chemical solutions offering companies in the world. The company operates through four business segments, namely, elastomers business, plastic business, digital solution business, and lifesciences business. It offers photoresist materials under the digital solution business. The company has its presence in 41 overseas location including the US, Europe, China, South Korea, Taiwan, and Thailand. In March 2018, JSR Corporation set up a new manufacturing facility in Belgium. Through this expansion, the company aims to enable the manufacturing and quality control of EUV photoresists for the semiconductors industry.

Shin-Etsu Chemical is one of the leading manufacturers and distributors of synthetic resin and other chemicals. The company operates through six business segments, namely, PVC/chlor-alkali business, semiconductor silicon business, silicone business, electronics and functional materials business, specialty chemicals, and processing, trading & specialized services business. It offers photoresist under the electronics and functional materials business. The company has a strong presence in over 20 countries and regions. In November 2018, Shin-Etsu Chemical established its first overseas photoresist production plant in Yunlin County, Taiwan. The new plant is expected to create a stable supply chain to device manufacturers located in the vicinity. The company also planned to invest USD 126 million for the expansion of its photomask business in October 2018. The new investment will be implemented at the existing plants of Echizen City and Naoetsu City. It is expected that this move will increase its photomask production capacity by 30%.

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