What will be factors contributing in Photoresist And Photoresist Ancillaries Market in near future? The Dow Chemical Company, JSR Corporation, Shin-Etsu, Sumitomo Chemical, LG Chem, Asahi Kasei Corporation
The semiconductor industry worldwide, in 2016, was valued in excess of USD 300 billion and is likely to grow at a significant rate owing to economic development, superior electronic gadget demand, and increasing per capita disposable income. These factors will enhance the semiconductor market demand which in turn will boost the global photoresist and photoresist ancillaries market demand.
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Photoresist And Photoresist Ancillaries Market is set to surpass USD 6 billion by 2024 as per a new research report. Stringent government regulations relating to the health and environmental hazards may in future slow down the market growth. The product is solvent-based and includes cross-linking, photosensitive chemicals, surfactants, stabilizers, polymer resins, and electronic-grade agents which give out organic compounds that are volatile and carcinogenic natured that pollute the air and are hazardous to humans. This, in future years may hamper the photoresist and photoresist ancillaries market growth.
Based on the product grade, the photoresist market is bifurcated into ArF dry, ArF immersion, KrF, i-line & g-line. The ArF immersion finds its use in the production of nano and micro scale electronics and hold a significant share in the market. Likely to grow with a decent growth rate, the dry grade ArF is used in the photolithography and photo-patterning processes. KrF is used in the making of microelectronics and in 2016, registered a market share in excess of USD 400 million.
- Photoresist Ancillaries Market By Product
• Antireflective coatings
• Edge bead removers
• Photoresist developers
- Photoresist & Photoresist Ancillaries Market By Application
• Semiconductors and integrated circuits
• Printed circuit boards
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The photoresist ancillaries market is segmented into four major categories on the basis of product as photoresist developers, antireflective coatings, edge bead removers, and others which consists of adhesion promoters, primers, etchers, and solvents.
The photoresist developers segment is likely witness a steady growth rate in the forecast period owing to its user and environment friendly properties. Holding a considerable share in the market, edge bead removers will show healthy gains till 2024 owing to its extensive use in photolithography. Owing to multiple reflection and contrast improvement properties, antireflective coatings will gain notable photoresist and photoresist ancillaries market share in future.
Considering application, the photoresist and photoresist ancillaries market is classified as printed circuit boards and integrated circuits & semiconductors. The printed circuit boards hold a significant share in the total photoresist and photoresist ancillaries market owing to its wide applications in the defense, medical, automobile, lighting and electrical devices industry. Due to more demand in the electronics and semiconductors sector, integrated circuits and semiconductors will grow at a significant rate.
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Due to the booming electronic and electrical industries, Asia Pacific holds a substantial share in the global photoresist and photoresist ancillaries market. For instance, China, Japan and South Korea are leading the market in this region due to the outsourcing of electronic production from the U.S. and Europe to these areas. The North America photoresist and photoresist ancillaries market in 2016, was valued over USD 350 million and will showcase steady growth in coming years.
Prominent players operating in the global photoresist and photoresist ancillaries market include DuPont, Dow Chemical, JSR Corporation, Tokyo Ohka Kogyo, AZ Electronic Materials, Avantor Performance Materials, FUJIFILM Electronic Materials, Sumitomo Chemical, LG Chem and Shin-Etsu Chemical to name a few.
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