Atomic Layer Deposition Market Forecasting Regional & Global Analysis With: Picosun Oy, Novellus Systems, Beneq, ASM, ATMI, Applied Materials, Hitachi Kokusai Electric America Ltd, ADEKA USA CORPORATION, Veeco , Oxford Instruments, Kurt J. Lesker Company
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Atomic layer deposition is the technique of deposition which utilizes thin film that is based on sequential use in gas phase process. The process is considered as chief process in the fabrication of semiconductor devices, and part of the set of tools available for the synthesis of nano-technology materials. ALD is considered as one of the superior deposition methods for producing thin and conformal films. The increasing electronics industry and semiconductor solutions are driving the market. Numerous technological advancements and product launches are occurred in the market which propels the growth of the market.
Global Market is expected to reach USD 1,137.50 million by 2025, from USD 1137.50 million in 2017 growing at a CAGR of 30.0% during the forecast period of 2018 to 2025.Some of the major players operating in the market are
· Adeka Corporation
· Applied Materials Inc
· ASM International N.V.
· ATMI Inc.
· Beneq Oy
· Cambridge NanoTech Inc
· Hitachi Kokusai Electric Inc
· Kurt J. Lesker Co
· Metryx Ltd
· Novellus Systems Inc
· Oxford Instruments plc
· Picosun Oy
Others: Praxair Technology Inc, Sigma-Aldrich Co. LLC, Lam Research Corporation, Aixtron SE, Tokyo Electron Limited, Denton Vacuum LLC, Veeco Instruments, Canon Anvela Corporation, Entergis Inc., ALD NanoSolutions, Inc., Encapsulix, Nano-Master among Others. The global atomic layer deposition market is highly fragmented and the major players have used various strategies such as new product launches, expansions, agreements, joint ventures, partnerships, acquisitions, and others to increase their footprints in this market. The report includes market shares of atomic layer deposition market for global, Europe, North America, Asia Pacific and South America.
· Beneq offers, a thin film technology of atomic layer deposition which enables new and improved products. This thin film coating method at true nanometer scale offers precise control of the film thickness and it is highly repeatable and scalable process.
· In December 2017, Hind High Vacuum Co Pvt Ltd (HHV), a vacuum science and technology company which deals with the major clients like HAL, ISRO, BARC, Titan and others, launched its first developed atomic layer deposition (ALD) system. This system is based on technology transferred from IIT Bombay.
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Major Market Drivers and Restraints:
· Increasing demand for ALD films in photovoltaic (PV) cells
· Increasing demand in the medical and aerospace electronic field
· Technological advancements in atomic layer deposition
· High investment cost
· Lack of skilled workforce
The global atomic layer deposition market is based on Product, Application And Geography.
· Based on product the market is segmented into
• Metal ALD
• Aluminum oxide ALD
• Plasma enhanced ALD
• Catalytic ALD and others
· Based on application the market is segmented into
• Solar devices
• Medical equipment and others
· Based on Geography the global atomic layer deposition market report covers data points for 28 countries across multiple geographies namely North America & South America, Europe, Asia-Pacific and, Middle East & Africa.
· Some of the major countries covered in this report are U.S., Canada, Germany, France, U.K., Netherlands, Switzerland, Turkey, Russia, China, India, South Korea, Japan, Australia, Singapore, Saudi Arabia, South Africa and, Brazil among others.
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