High-k and ALD/CVD Metal Precursor Market Outlook to 2024, Top Key Players are Air Liquide, Air Products, Praxair, Inc, The Dow Chemical Company, The Linde Group, REC and Samsung Electronics

Global high-k and ALD/CVD metal precursor market is characterized by notable number of players offering diverse and cost-effective solutions. Ongoing need to develop processes to form thin film with desired properties for various applications will drive demand over the forecast timeline.

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Regulatory policies and initiatives undertaken by the government for the manufacturing of semiconductor devices will give impetus to high-k and ALD/CVD metal precursor market share. The industry participants are focused on optical, dielectric and chemical properties of the hybrid organic-inorganic films to reduce manufacturing costs. Furthermore, increasing IPR protection measures will have an emphasizing role in chemical designs with rising IPR filings on precursor material compositions.

The industry needs collaboration across the value chain both in terms of hardware and new molecules to deliver the chemicals effectively in the equipment. Incorporation of intellectual property rights protection measures will have an increasing role in chemical designs.

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The optical, mechanical, dielectric, chemical and conductive properties of the hybrid organic-inorganic films are projected to boost the high k metal precursors market share over the forecast timeframe. Escalating demand for various thin film materials in new industrial applications will lead towards technological advancement and innovation. High risk of impurity levels may challenge high-k and ALD/CVD metal precursor market size from 2016 to 2024.

Europe is another region which is experiencing a significant coverage of global high-k and ALD/CVD metal precursor industry share in terms of revenue. The tremendous growth projection of the market can be credited to its wide manufacturing base of VLSI, which allows the prominence of metal precursor application in some of the memory devices including DRAMs (dynamic random access memory), CMOS, metal insulator metal diodes, ferroelectric logic etc. In addition to this, heavy investments in developing advanced wafer fabrication process will further widen its scope of applications. U.S is another region which is expected to get benefitted by this advancement in wafers processing. U.S. high-k and ALD/CVD metal precursor market having collected a revenue of more than USD 30 million in 2015, is projected to be the major revenue contributor for North America market.

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Major industry players are Air Liquide, Air Products, Praxair, Inc, The Dow Chemical Company, The Linde Group, REC and Samsung Electronics.

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