Press release
Extreme Ultraviolet Lithography Market 2018 Global Top Companies are Cannon Inc., ASML, Intel Corporation, Nikon Corporation, Nuflare Technology Inc., Samsung Corporation, SUSS Microtec AG, Taiwan Semiconductor Manufacturing Company Limited (Tsmc), Ultrat
Global Extreme Ultraviolet Lithography (EUVL) Market
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Global Extreme Ultraviolet Lithography (EUVL) Market, By End User (Integrated Device Manufacturer (IDM), Foundry, Others.), Equipment (Light Source, Optics, Mask, Others), Light Source (Laser Produced Plasmas (LPP), Vacuum Sparks, Gas Discharge), Geographical Segments (North America, South America, Europe, Asia-Pacific, Middle East and Africa)- Industry Trends and Forecast to 2025
Market Analysis: Global Extreme Ultraviolet Lithography (EUVL) Market
Global Extreme Ultraviolet Lithography (EUVL) Market is expected to reach USD 9.02 billion by 2025 from USD 1.22 billion in 2017 and is projected to grow at a CAGR of 28.14% in the forecast period of 2018 to 2025. The upcoming market report contains data for historic years 2016, the base year of calculation is 2017 and the forecast period is 2018 to 2025.
Market Drivers and Restraints:
• Reduction in the complexity and cost
• Increasing trend of miniaturization
• High price of EUVL systems
• Complexity of design and infrastructure readiness.
Table of Contents
1. Introduction
2. Market Segmentation
3. Market Overview
4. Executive Summary
5. Premium Insights
6. Global, By Component
7. Product Type
8. Delivery
9. Industry Type
10. Geography
10.1. Overview
10.2. North America
10.3. Europe
10.4. Asia-Pacific
10.5. South America
10.6. Middle East & Africa
11. Company Landscape
12. Company Profiles
13. Related Reports
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Global Extreme Ultraviolet Lithography (EUVL) Market report contains all the profiles of the Dominating players and brands that make a huge impact on the Global Extreme Ultraviolet Lithography (EUVL) industry by their moves like developments, product launches, joint ventures, merges and accusations.
Competitive Analysis: Global Extreme Ultraviolet Lithography (EUVL) Market
The global extreme ultraviolet lithography (EUVL) is fragmented and the major players have used various strategies such as new product launches, expansions, agreements, joint ventures, partnerships, acquisitions, and others to increase their footprints in this market in order to sustain in long run. The report includes market shares of extreme ultraviolet lithography (EUVL) market for global, Europe, North America, Asia Pacific and South America.
Key Players: Global Extreme Ultraviolet Lithography (EUVL) Market
• Cannon Inc.,
• ASML,
• Intel Corporation,
• Nikon Corporation,
• Nuflare Technology Inc.,
• Samsung Corporation,
• SUSS Microtec AG,
• Taiwan Semiconductor Manufacturing Company Limited (Tsmc),
• Ultratech Inc.,
• Vistec Semiconductor Systems,
• Carl Zeiss,
• Toppan Printing,
• NTT Advanced Technology,
• Toshiba,
• Global foundries
• among other.
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About Data Bridge Market Research:
Data Bridge Market Research set forth itself as an unconventional and neoteric Market research and consulting firm with unparalleled level of resilience and integrated approaches. We are determined to unearth the best market opportunities and foster efficient information for your business to thrive in the market. Data Bridge endeavors to provide appropriate solutions to the complex business challenges and initiates an effortless decision-making process.
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Email: sopan.gedam@databridgemarketresearch.com
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