High-k and ALD/CVD Metal Precursor Market Robust Growth By Leading Key Players: Dow Chemical, ATMI, Air Liquide, Air Products, Chemicals, Adeka, Upchem
High-k and ALD/CVD Metal Precursor Market is forecast to exceed USD 950 million at 18% CAGR by 2024. Processes to develop thin film with the required properties for numerous applications has pushed notable companies to offer cost-effective and differentiated solutions. New compressed devices offer high aspect ratios and thin film formation by ALD or CVD.
Low thermal stability of metal-organic compounds has lent an edge as molecular precursor. Sputtering techniques and other methods are used to deposit Phase Change Materials (PCM) which are weak regarding the uniformity of deposition. Thus, substitute methods provide benefits such as compositional control and industrial scaling, which in turn drives the high-k and ALD/CVD metal precursor market demand.
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Top Key Players: -
High-k and ALD/CVD metal precursor market participants include Dow Chemical, ATMI, Air Liquide, Air Products and Chemicals, Adeka, UP Chem. Major trends followed by companies include mergers and acquisitions, strategic joint ventures.
Regional Segmentations: -
Gates are forecast to grow at over 20% CAGR, and possess significant potential to replace silicon oxide in the 65nm CMOS space. Properties such as compatibility with gate electrode material, chemical and thermal stability, high dielectric constant and interface state density make it a preferable choice thus driving the demand for this segment.
Asia Pacific was the leading regional industry, with China accounting for over 35% of the high-k and ALD/CVD metal precursor market share. Growing semiconductor demand from BRIC countries due to rising consumption of consumer electronics and durables coupled with factors like low cost, portability will drive the regional demand.
Partial Chapter of the Table of Content
Chapter 1. Methodology and Scope
1.1. Research Methodology
1.1.1. Initial data exploration
1.1.2. Statistical model and forecast
1.1.3. Industry insights and validation
1.1.4. Research scope & assumptions
1.2. Data Sources
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Chapter 2. Executive Summary
2.1. High-k and ALD/CVD metal precursor industry 3600 synopsis, 2013 - 2024
2.1.1. Business trends
2.1.2. Regional trends
2.1.3. Product trends
Several manufacturers are now shifting their focus towards chemical, dielectric and optical properties of hybrid inorganic-organic films in order to minimize manufacturing costs. Increasing intellectual property rights (IPR) protection laws will play a key role in IPR filings on chemical designs and precursor material composition. Strategic alliances along the high-k and ALD/CVD metal precursor market value chain are required to effectively provide chemicals for the equipment in terms of new molecules and hardware.
Cost-effective and seamless fabrication of semiconductor devices for complicated 3D architectures have widened the scope for extensive R&D to develop high-quality sophisticated precursors in cylinders. Government initiatives and regulations regarding semiconductor device manufacturing will provide a boost to the high-k and ALD/CVD metal precursor market share over the forecast timeframe.
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