Nanoimprint Lithography System Market - Next Generation Lithography, Evolution of the Technology
The semiconductor industry has always been looking for alternative patterning methods in order to follow Moore′s law, which has been formulated to predict the evolution of the technology nodes. Now, extreme UV lithography (EUV), 193 nm immersion lithography, mask less lithography (MLL) techniques and nanoimprint lithography (NIL) are considered as candidates for the so called Next Generation Lithography (NGL) at 32 nm and 22 nm nodes. In parallel, imprint technology has been promoted by a large scientific community and non-IC industry segments including high-density storage, optoelectronics, telecommunication as well as biochips or micro total analysis systems.
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Scope of the Report:
This report focuses on the Nanoimprint Lithography System in global market, especially in North America, Europe, Asia-Pacific, South America, Middle East and Africa. This report categorizes the market based on manufacturers, regions, types and applications.
Market Segment by Manufacturers, this report covers
Canon (Molecular Imprints)
Market Segment by Regions, regional analysis covers
North America (United States, Canada and Mexico)
Europe (Germany, France, UK, Russia and Italy)
Asia-Pacific (China, Japan, Korea, India and Southeast Asia)
South America (Brazil, Argentina, Colombia)
Middle East and Africa (Saudi Arabia, UAE, Egypt, Nigeria and South Africa)
Market Segment by Type, covers
Hot Embossing (HE)
UV-based Nanoimprint Lithography (UV-NIL)
Micro Contact Printing (μ-CP)
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Market Segment by Applications, can be divided into
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