Press release
Global Metal-Organic Chemical Vapour Deposition (MOCVD) Market to Grow at a CAGR Of 13.59% During The Period 2017-2021
Companies Mentioned: AIXTRON, Taiyo Nippon Sanso, Veeco Instruments, Agnitron Technology, Alliance MOCVD, CVD Equipment Corporation, HC SemiTek, JUSUNG ENGINEERING, and Xycarb Ceramics.
About MOCVD, MOCVD is a technique used by semiconductor manufacturers for depositing a very thin layer of metal oxide compound semiconductor material onto a semiconductor wafer. It is predominantly used in the manufacturing process of III-V compound semiconductors, especially for those that use GaN. These semiconductors are the most important base material for manufacturing LEDs, lasers, power electronics, and photovoltaic cells.
Analysts forecast the Global Metal-Organic Chemical Vapour Deposition (MOCVD) Market to Grow at a CAGR Of 13.59% During The Period 2017-2021.
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Covered in this report
The report covers the present scenario and the growth prospects of the global MOCVD market for 2017-2021. To calculate the market size, the report considers value of volume.
The market is divided into the following segments based on geography:
• Americas
• APAC
• EMEA
Global MOCVD Market 2017-2021, has been prepared based on an in-depth market analysis with inputs from industry experts. The report covers the market landscape and its growth prospects over the coming years. The report also includes a discussion of the key vendors operating in this market.
Browse Full Report with TOC: http://www.orbisresearch.com/reports/index/global-mocvd-market-2017-2021
Key vendors
• AIXTRON
• Taiyo Nippon Sanso
• Veeco Instruments
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Other prominent vendors
• Agnitron Technology
• Alliance MOCVD
• CVD Equipment Corporation
• HC SemiTek
• JUSUNG ENGINEERING
• Xycarb Ceramics
Market driver
• Increased demand for renewable sources of energy
Market challenge
• High complexity of MOCVD process
Market trend
• Emergence of high-powered electronic devices
Key questions answered in this report
What will the market size be in 2021 and what will the growth rate be?
What are the key market trends?
What is driving this market?
What are the challenges to market growth?
Who are the key vendors in this market space?
What are the market opportunities and threats faced by the key vendors?
What are the strengths and weaknesses of the key vendors?
Table of Contents
PART 01: Executive summary
PART 02: Scope of the report
PART 03: Research Methodology
PART 04: Introduction
PART 05: Technology landscape
PART 06: Market landscape
PART 07: Market segmentation by end-user
PART 08: Geographical segmentation
PART 09: Decision framework
PART 10: Drivers and challenges
PART 11: Market trends
PART 12: Vendor landscape
PART 13: Appendix
List of Exhibits
Exhibit 01: Requirements for deposition
Exhibit 02: Interrelated components of CVD equipment
Exhibit 03: Type of coating and reactor type
Exhibit 04: Steps involved in CVD process
Exhibit 05: Factors influencing the growth of film on the substrate
Exhibit 06: Factors controlling the CVD process
Exhibit 07: Factors for choosing the deposition material
Exhibit 08: Advantages of CVD
Exhibit 09: AP-CVD
Exhibit 10: DP-CVD
Exhibit 11: LP-CVD
Exhibit 12: MO-CVD
Exhibit 13: Global MOCVD market 2016-2021 ($ millions)
Exhibit 14: Five forces analysis
Exhibit 15: Global MOCVD market by end-user 2016-2021 (% share of revenue)
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