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Computational Lithography Software Market Share Expands with Advanced Semiconductor Node Development | Valuates Reports
Computational Lithography Software Market SizeThe global market for Computational Lithography Software was valued at US$ 1214 million in the year 2024 and is projected to reach a revised size of US$ 3023 million by 2031, growing at a CAGR of 14.1% during the forecast period.
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The Computational Lithography Software Market is experiencing significant market growth driven by increasing semiconductor complexity, shrinking process nodes, and rising demand for advanced chip performance. Computational lithography software plays a critical role in optimizing photomask patterns and enhancing resolution in semiconductor fabrication. As foundries and integrated device manufacturers (IDMs) move toward sub-7nm and advanced packaging technologies, market size continues to expand. Key market trends include AI-driven optimization, extreme ultraviolet (EUV) lithography integration, and high-performance computing (HPC) acceleration, supporting a strong market forecast and sustained long-term market growth.
By type, Optical Proximity Correction (OPC) holds a substantial market share due to its essential role in correcting image distortions during lithography processes. Source Mask Optimization (SMO) is witnessing robust market growth as chipmakers demand greater pattern fidelity at advanced nodes. Multiple Patterning Technology (MPT) maintains significant market size, particularly in mature and intermediate nodes where EUV adoption remains selective. Inverse Lithography Technology (ILT) is gaining market growth momentum due to its ability to deliver enhanced resolution and yield improvements, reflecting evolving market trends toward precision-driven manufacturing.
In terms of application, the Memory segment accounts for a considerable market share, driven by demand for high-density DRAM and NAND flash production. The Logic/MPU segment demonstrates strong market growth, supported by advanced processor development for AI, cloud computing, and mobile devices. Other semiconductor applications also contribute to growing market size, reinforcing diversified revenue streams and sustained market growth across chip categories.
Leading companies shaping the competitive landscape include ASML, KLA Corporation, Siemens, Synopsys, Cadence Design Systems, and Dongfang Jingyuan Electron Co., Ltd.. These companies maintain strong market share through advanced algorithm development, integrated EDA toolchains, and strategic collaborations with semiconductor foundries. Continuous innovation in AI-assisted pattern optimization and scalable computing architectures further strengthens their competitive positioning and supports sustained market growth.
Regionally, Asia-Pacific dominates market size due to large-scale semiconductor manufacturing in China, Japan, and South Korea. North America maintains significant market share supported by advanced logic chip design and strong EDA ecosystem presence. Europe demonstrates stable market growth driven by semiconductor equipment leadership and research initiatives. Emerging markets in Southeast Asia and other regions are gradually contributing to market size through expanding semiconductor fabrication capacity. The market forecast remains highly positive as next-generation semiconductor nodes, AI acceleration demands, and EUV-based production continue to shape evolving market trends and drive consistent global market growth in the Computational Lithography Software Market.
Segment by Type
• OPC
• SMO
• MPT
• ILT
Segment by Application
• Memory
• Logic/MPU
• Others
By Company
ASML, KLA, Siemens, Synopsys, Cadence, Dongfang Jingyuan Electron Co., Ltd., Yuwei Optics
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