Press release
Photomask Market to Reach US$9.75 Billion by 2031, Says Stratview Research
Stratview Research
Stratview Research, a global market research firm, has launched a report on the global market, which provides a comprehensive outlook of the global and regional industry forecast, current & emerging market trends, segment analysis, competitive landscape, & more.
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Market Statistics
• Market size: US$5.8 billion in 2024
• Forecast value: US$9.75 billion by 2031
• CAGR: 7.7% (2025-2031)
• Forecast period: 2025-2031
• Base year: 2024
• Total number of segments: 6
• Tables & figures: 100+
• Country-Level Market Assessment: 20
Market Segmentation
Photomask Market, by Shop Analysis
• Captive
• Merchant
Photomask Market, by Use
• IC
• FPD
Photomask Market, by Material
• Quartz Glass + Chrome
• Molybdenum Silicide
• Multilayer Mo/Si Stack
Photomask Market, by Type
• Binary Mask
• Phase-Shift Mask (PSM)
• EUV Mask
Photomask Market, by Technology / Light Source Analysis
• DUV (248 nm, 193 nm)
• EUV (13.5 nm, reflective)
• Others (i-line, g-line, etc.)
Photomask Market, by Region
• North America
• Europe
• Asia-Pacific
• Rest of the World
Segment Analysis
In the shop analysis category, captive is the dominant segment as major semiconductor manufacturers maintain in-house mask production to protect design IP and ensure tight process control, while merchant is the fastest-growing segment due to rising fabless semiconductor companies and increased outsourcing to foundries, signaling opportunities for external mask suppliers.
Under use, IC photomasks hold the largest share and also represent the fastest-growing category driven by the rising complexity and volume of logic, memory, and high-performance processors that require numerous mask layers, creating strong demand for advanced lithography masks.
For material, Quartz Glass + Chrome remains dominant because it is widely used in binary masks for mature and high-volume semiconductor production, while Multilayer Mo/Si Stack is the fastest-growing material segment due to rapid adoption of EUV masks needed for cutting-edge logic and memory chips.
By mask type, binary masks lead the market given their compatibility with established lithography processes across automotive, consumer electronics, and industrial applications, whereas EUV masks are the fastest-growing type as advanced semiconductor manufacturers increasingly adopt EUV for next-generation node production.
In the technology/light source category, DUV remains dominant because most semiconductor manufacturing, especially at mature nodes, still relies heavily on DUV lithography, though EUV technology is emerging rapidly for high-end applications, underscoring the need for suppliers to address both established and advanced technology demands.
Regional Insights
Asia-Pacific is the largest and fastest-growing photomask market as it hosts the world's highest concentration of semiconductor manufacturing, with countries like China, Taiwan, South Korea, and Japan expanding advanced-node logic, memory, and foundry capacities, thereby boosting demand for both high-volume and advanced photomask sets.
Market Drivers
• Rising production of advanced semiconductors requiring higher mask counts per device due to complex multi-layer patterning.
• Increasing adoption of EUV lithography for advanced logic and memory chip manufacturing.
• Growth in end-use sectors such as AI hardware, automotive electronics, and data center processors driving demand for more photomasks.
• Expansion of fabless semiconductor companies leading to more outsourced mask production.
• Ongoing investments in semiconductor fabrication facilities, especially in Asia-Pacific, fueling photomask demand.
Top Companies in the Market
• Photronics, Inc
• Toppan Electronics Products Co., Ltd. (Tekscend Photomask)
• Dai Nippon Printing Co., Ltd
• SK-Electronics Co., LTD
• Hoya Corporation
• Compugraphics International, Ltd.
• Taiwan Mask Corporation
• Shenzhen Qingyi Photomask, Ltd.
• Shenzhen Newway Photomask Making Co., Ltd.
• LG Innotek Co., Ltd.
FAQs
1. How large is the global photomask market expected to be by 2031?
The photomask market is anticipated to reach approximately US$9.75 billion by 2031.
2. What growth rate is the photomask market forecast to achieve through 2031?
The market is expected to grow at a CAGR of about 7.7% from 2024 to 2031.
3. Which photomask type segment is growing the fastest?
EUV masks are currently the fastest-growing mask type due to their use in advanced logic and memory production.
4. What shop type segment shows the most opportunity for external suppliers?
The merchant segment is expanding fastest as fabless companies and foundries outsource photomask production.
5. What region is driving the most demand for photomasks?
Asia-Pacific leads as the largest and fastest-growing market owing to extensive semiconductor manufacturing capacity in the region.
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Stratview Research is a global market research firm that highly specializes in aerospace & defense, chemicals, and a few other industries.
It launches a limited number of reports annually on the above-mentioned specializations. Thorough analysis and accurate forecasts in this report enable the readers to take convincing business decisions.
Stratview Research has been helping companies meet their global and regional growth objectives by offering customized research services. These include market assessment, due diligence, opportunity screening, voice of customer analysis, market entry strategies, and more.
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