Semiconductor Cleaning Agents Market Set to Surge - Key Insights You Must Know

Semiconductor Cleaning Agents Market Size

The global market for Semiconductor Cleaning Agents was valued at US$ 1805 million in the year 2024 and is projected to reach a revised size of US$ 2714 million by 2031, growing at a CAGR of 6.0% during the forecast period.

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The 2025 U.S. tariff policies introduce profound uncertainty into the global economic landscape. This report critically examines the implications of recent tariff adjustments and international strategic countermeasures on Semiconductor Cleaning Agents competitive dynamics, regional economic interdependencies, and supply chain reconfigurations.

Semiconductor cleaning agents are a general term for specialized chemicals used in wafer manufacturing and advanced packaging processes. They are primarily used to remove contaminants such as organic residues, polymer byproducts, particles, and metal ions generated during etching, photolithography, and chemical mechanical polishing (CMP) to ensure the integrity of the device structure and the consistency and reliability of subsequent processes. Based on the different process stages and main cleaning targets, this paper defines semiconductor cleaning agents as three main types: post-etching cleaning solutions (for byproducts and particle residues in etched trenches, holes, and surfaces), photoresist cleaning solutions (for the stripping and removal of photoresist and its residues), and post-CMP cleaning solutions (for cleaning and corrosion control of slurry particles, chemical residues, and metal ions after polishing).

In 2024, the sales volume of CMP post-cleaning solution was approximately 18,000 tons, with an average price range of US$11.5 per kilogram.

Semiconductor cleaning chemistries have evolved from "auxiliary chemicals" into a set of mission-critical material systems that are deeply embedded in the process window, underpinning the stable advancement of etch, lithography and CMP into leading-edge nodes. Around the three categories you defined-photoresist cleaning solutions, post-etch cleaning solutions and post-CMP cleaning solutions-the global competitive landscape is highly concentrated and shows a clear "process module × leading formulators" pattern. In photoresist cleaning, players such as Dongjin Semichem, DuPont, Merck (Versum Materials), ENF Tech and Tokyo Ohka dominate and are tightly coupled with photoresist and front-end lithography processes. In post-CMP cleaning, Entegris, Merck, Mitsubishi Chemical and Fujifilm lead the market, with a strong focus on co-optimization with pads, slurries and Cu/low-k interconnect structures. In the post-etch cleaning segment, Entegris, Qnity (DuPont), Merck and JSR Corporation are closely aligned with the evolution of plasma etch and materials stacks, continuously iterating around polymer residue removal, metal ion control and low-damage cleaning. In practice, the same company often participates in multiple sub-segments, yet builds differentiated product families for each process module, reflecting a system-level understanding of the entire flow and strong co-development capabilities with device makers.

From a market perspective, semiconductor cleaning agents represent a "process-driven specialty chemicals" segment that is not huge in absolute size, but features extremely high technical barriers, very long qualification cycles and exceptionally strong customer stickiness. On one hand, these chemistries must balance cleaning performance, material compatibility, metallic contamination, and environmental and safety constraints within a very narrow process window, placing stringent demands on formulation design, raw material purity control, in-line stability and co-optimization with tools and processes. On the other hand, as logic and memory migrate toward more advanced nodes, 3D NAND stack heights increase, and advanced packaging scales up, the importance of post-etch, photoresist and post-CMP cleaning in the process flow continues to rise-driving a shift from "single chemical products" toward "process-step- and material-stack-specific cleaning solutions." Overall, the semiconductor cleaning market is characterized by a combination of "cross-segment portfolios from global leaders + high specialization at each process module," making it both a core battleground for international materials giants to reinforce their moats and a strategic entry point for local suppliers to penetrate the high-end semiconductor chemicals value chain, pursue import substitution, and upgrade their value-added, solution-oriented service capabilities

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By Type
• Post-etching Cleaning Solutions
• Photoresist Cleaning Solutions
• Post CMP Cleaning Solutions

By Application
• Acidic Cleaning Solution
• Alkaline Cleaning Solution

Key Companies
Entegris, Qnity (DuPont), Merck (Versum Materials), JSR Corporation, Mitsubishi Gas Chemical, Dongjin Semichem, FUJIFILM, BASF, LG Chem, Tokyo Ohka Kogyo, ENF Tech, Nagase, Kanto Chemical, Avantor, Solexir Technoloy, Technic Inc, Anji Microelectronics Technology, Jiangyin Jianghua Micro-electronic Materials Co., Ltd, San Fu Chemical Co., Ltd

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