Semiconductor Pellicle Market Share Driven by Advanced Lithography Demands and Rising Chip Fabrication Needs | Valuates Reports

Semiconductor Pellicle Market Size
The global market for Semiconductor Pellicle was valued at US$ 430 million in the year 2024 and is projected to reach a revised size of US$ 640 million by 2031, growing at a CAGR of 6.0% during the forecast period.

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The Semiconductor Pellicle Market is gaining strong momentum as chip manufacturers increase their reliance on high-precision photomask protection to support advanced lithography processes. Market size expansion is guided by market trends such as the growing complexity of semiconductor nodes, higher sensitivity of photomasks, and the escalating need to maintain defect-free wafer production. Advancements in lithography technologies, rising fabrication investments, and increased adoption of next-generation patterning techniques continue to accelerate overall market growth.

In the type segment, ArF pellicles hold the largest market share due to their broad deployment across leading-edge immersion lithography processes. They deliver high transmission, thermal stability, and compatibility with mainstream semiconductor manufacturing flows. KrF pellicles remain widely used for mature and specialty nodes, while EUV pellicles represent the fastest-growing segment as chipmakers push toward extreme ultraviolet lithography. The Others category supports niche applications where specialized pellicle materials or configurations are required.

By application, IC foundry accounts for the highest market share, driven by large-scale wafer production and continuous demand for defect control in high-volume manufacturing. IC bumping and IC substrate applications also contribute significantly, supported by the expanding advanced packaging ecosystem. Meanwhile, MEMS and LED package applications show steady growth as manufacturers depend on consistent mask protection to ensure dimensional accuracy and high device reliability.

The competitive landscape is shaped by leading companies such as MITSUI Chemical, FINE SEMITECH, Shin-Etsu, Micro Lithography, Inc., S&S Tech, INKO, NEPCO, and Canatu. These players maintain strong market share through their expertise in polymer film technologies, optical material development, and pellicle durability optimization. Their continuous improvements in transmission quality, contamination control, and high-temperature resistance help strengthen their competitive positioning in both mainstream and advanced lithography segments.

Regionally, Japan remains a key production hub due to its leadership in pellicle material science and lithography ecosystem integration. North America and Europe maintain strong capabilities through ongoing technology innovation and established semiconductor infrastructures. Asia-Pacific-especially China, South Korea, and Taiwan-leads consumption as major foundries and IDMs continue expanding their fabrication capacities. Additional growth from Southeast Asia and Latin America further supports the global market forecast, pointing toward sustained market growth driven by innovation, manufacturing expansion, and increasing adoption of advanced lithography technologies.

Segment by Type

• ArF Pellicle
• KrF Pellicle
• EUV Pellicle
• Others

Segment by Application

• IC Bumping
• IC Foundry
• IC Substrate
• MEMS
• LED Package

By Company

MITSUI Chemical, FINE SEMITECH, Shin-Etsu, Micro Lithography, Inc., S&S Tech, INKO, NEPCO, Canatu

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