Chemical Mechanical Planarization Point-of-Use (POU) Filters Market Set to Surge - Key Insights You Must Know

Chemical Mechanical Planarization Point-of-Use (POU) Filters Market

The global market for Chemical Mechanical Planarization Point-of-Use (POU) Filters was valued at US$ million in the year 2024 and is projected to reach a revised size of US$ million by 2031, growing at a CAGR of %during the forecast period.

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Chemical Mechanical Planarization (CMP) is a polishing process used to manufacture wafers for the semiconductor industry. It requires the use of a polishing tool and polishing slurry. The slurry in the tool is delivered to the wafer surface and may contain large particles/agglomerates (> 1 μ) as a result of shipping/handling issues, drying, and interactions within the slurry distribution systems. These large particles can, in turn, increase the level of defectives (scratches) on the semiconductor wafer surface found after the CMP process has been completed. One of the solutions for decreasing the level of defects caused by large slurry particles is through the use of slurry filtration. For these applications, 0.5 to 5 micron filters are typically used.

CMP Slurry Filters are designed to maximize many different semiconductor processes performance by controlling the size, and concentration of slurry particles. Cutting edge CMP filtration technologies lead to higher yields and less defects. By implementing industry leading filter designs, slurry particle size, and quantity of Large Particle Counts (LPCs) can be controlled to specified process parameters.

North American market for Chemical Mechanical Planarization Point-of-Use (POU) Filters is estimated to increase from $ million in 2024 to reach $ million by 2031, at a CAGR of % during the forecast period of 2025 through 2031.

Asia-Pacific market for Chemical Mechanical Planarization Point-of-Use (POU) Filters is estimated to increase from $ million in 2024 to reach $ million by 2031, at a CAGR of % during the forecast period of 2025 through 2031.

The major global manufacturers of Chemical Mechanical Planarization Point-of-Use (POU) Filters include Entegris, Pall, Cobetter, 3M Company, Critical Process Filtration, INC, Graver Technologies, Parker Hannifin Corporation, Roki Techno Co Ltd., etc. In 2024, the world's top three vendors accounted for approximately % of the revenue.

By Type
• Removal Rating < 0.5 μm
• 0.5 μm≤Removal Rating 5 μm

By Application
• 300 mm Wafer
• 200 mm Wafer

Key Companies
Entegris, Pall, Cobetter, 3M Company, Critical Process Filtration, INC, Graver Technologies, Parker Hannifin Corporation, Roki Techno Co Ltd.

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