Press release
EUV Litho Mask Blank Market Set to Surge - Key Insights You Must Know
EUV Litho Mask Blank MarketThe global market for EUV Litho Mask Blank was valued at US$ million in the year 2024 and is projected to reach a revised size of US$ million by 2031, growing at a CAGR of %during the forecast period.
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Mask blanks are base substrate plates of photomasks in which optical films of several compositions are deposited on the polished surface of low thermal expansion glass substrate. It is core technical aspect of EUV lithography technology.
North American market for EUV Litho Mask Blank is estimated to increase from $ million in 2024 to reach $ million by 2031, at a CAGR of % during the forecast period of 2025 through 2031.
Asia-Pacific market for EUV Litho Mask Blank is estimated to increase from $ million in 2024 to reach $ million by 2031, at a CAGR of % during the forecast period of 2025 through 2031.
The major global manufacturers of EUV Litho Mask Blank include AGC Inc, Hoya, S&S Tech, Applied Materials, Photronics Inc, etc. In 2024, the world's top three vendors accounted for approximately % of the revenue.
By Type
• 7nm
• 5nm
By Application
• Semiconductor
• IC (Integrated Circuit)
Key Companies
AGC Inc, Hoya, S&S Tech, Applied Materials, Photronics Inc
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