Press release
Photomask Pellicle Market Set to Surge - Key Insights You Must Know
Photomask Pellicle Market SizeThe global market for Photomask Pellicle was valued at US$ 884 million in the year 2024 and is projected to reach a revised size of US$ 1493 million by 2031, growing at a CAGR of 7.8% during the forecast period.
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The process of preparing this Pellicle is also full of scientific and technological content. Usually, precise vacuum coating technology such as physical vapor deposition (PVD) or chemical vapor deposition (CVD) is used to form a uniform and dense film on the surface of the mask. This process requires precise control of parameters such as temperature, pressure and gas flow to ensure the quality and performance of the film.
Global key Photomask Pellicle players cover Mitsui Chemicals, Shin-Etsu, FINE SEMITECH, Micro Lithography, Inc., S&S Tech and INKO, etc. In terms of revenue, the global 3 largest companies occupied for a share nearly 85.67% in 2023.
By Type
• Hard Photomask Pellicle
• Soft Photomask Pellicle
By Application
• Semiconductors
• Flat Panel Display
Key Companies
Mitsui Chemicals, Shin-Etsu, FINE SEMITECH, Micro Lithography Inc (MLI), S&S Tech, 印科微(INKO), NEPCO, Canatu
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