Global and U.S. Polycrystalline Silicon Thin Film Market Report, Published by QY Research.

Motech Industries, a solar cell manufacturer in Taiwan faced declining conversion efficiency and yield loss in its thin-film photovoltaic production lines due to inconsistent grain structures in the absorber layer. Traditional amorphous silicon films exhibited lower carrier mobility and light absorption, limiting power output. To address this, the company implemented Polycrystalline Silicon Thin Films, produced through low-pressure chemical vapor deposition (LPCVD) and solid-phase crystallization techniques. These films offer larger grain sizes, higher electron mobility, and superior thermal stability compared to amorphous silicon, enabling improved charge transport and enhanced photovoltaic efficiency. By optimizing deposition temperature and annealing profiles, the manufacturer achieved a 22% increase in module efficiency and extended service life under thermal cycling. The same thin-film technology is now widely used in TFT backplanes for high-resolution displays and next-generation flexible solar cells.

https://www.qyresearch.com/reports/5444861/polycrystalline-silicon-thin-film

Core market data:

Global market size: USD 1.3 billion
CAGR (2024-2030): 5.3%
Average price: USD 100000 per ton
Annual production: 12.5 kilotons
Gross margin: 38%
Production capacity: 15 kilotons

List of Main players:

Samsung Display (South Korea)
LG Display (South Korea)
Kyocera Display (Japan)
Sharp Display (Japan)
BOE Technology (China)
Tianma Microelectronics (China)
Visionox (China)
Truly Semiconductors (China)
HKC Display (China)
TCL CSOT (China)
AU Optronics (Taiwan)
Innolux (Taiwan)
HannStar Display (Taiwan)

1. By Deposition Method

Chemical Vapor Deposition (CVD)
Solid-Phase Crystallized (SPC)
Laser-Crystallized (LC)

2. By Substrate Type

Glass Substrate
Quartz Substrate
Flexible Polymer Substrate
Metal Foil Substrate

3. By Application

Photovoltaics
Semiconductors
Automotive Electronics
Consumer Electronics

4. By Doping Type

Undoped Poly-Si
Doped Poly-Si

Case study for bidding

Time: March 2024
Supplier: Wacker Chemie AG
Buyer: BOE Technology Group Co., Ltd. (China)
Product: PECVD Polycrystalline Silicon Thin Film (200 nm, Low-Temperature Process)
Quantity: 1.8 kilotons
Contract Value: USD 164 million
Delivery Timeline: February 2025

Detailed Application Scenario

In this project, BOE Technology used Wacker Chemie's PECVD-deposited polycrystalline silicon thin films in the backplane of high-resolution OLED displays. The film provided high electron mobility and uniform conductivity, enabling faster switching speeds and enhanced image clarity.

The low-temperature PECVD process allowed deposition on large-area glass substrates without warping, reducing energy consumption and improving yield. The fine-grained polycrystalline structure ensured stable electrical performance under prolonged thermal and electrical stress.

BOE selected this material for its superior uniformity, high charge carrier mobility, and compatibility with large-scale OLED production, outperforming amorphous silicon layers in both stability and performance. The project demonstrated how polycrystalline silicon thin films underpin the next generation of high-speed display and photovoltaic technologies by combining scalability, precision, and energy efficiency.

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