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PCMP Cleaning Chemistry Market Share Driven by Semiconductor Miniaturization and Advanced Wafer Processing | Valuates Reports

10-30-2025 11:21 AM CET | Advertising, Media Consulting, Marketing Research

Press release from: Valuates Reports

PCMP Cleaning Chemistry Market Size
The global market for PCMP Cleaning Chemistry was valued at US$ 201 million in the year 2024 and is projected to reach a revised size of US$ 312 million by 2031, growing at a CAGR of 6.6% during the forecast period.

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https://reports.valuates.com/request/sample/QYRE-Auto-4C850/Global_PCMP_Cleaning_Chemistry_Market_Insights_Forecast_to_2028

The PCMP Cleaning Chemistry Market is expanding steadily as the semiconductor industry continues to advance toward finer process nodes and higher integration density. Post-CMP (Chemical Mechanical Planarization) cleaning is critical to removing contaminants and preserving wafer integrity during chip fabrication. Increasing demand for defect-free surfaces, enhanced yield, and reliable performance in integrated circuits is driving market growth across major semiconductor manufacturing regions. Evolving market trends, such as the adoption of advanced chemistries for particle removal and surface passivation, are broadening the market size and reinforcing the importance of precision cleaning solutions in next-generation semiconductor processing.

By type, the acid material segment holds the largest market share, primarily due to its strong effectiveness in dissolving metallic contaminants and inorganic residues from wafer surfaces. Acidic formulations are widely preferred in high-precision CMP cleaning steps, ensuring minimal defectivity in sub-micron device nodes. Meanwhile, the alkaline material segment is witnessing accelerating market growth owing to its superior organic residue removal capabilities and compatibility with emerging low-k dielectric materials. The use of hybrid and pH-balanced formulations is also gaining attention, as manufacturers seek optimized cleaning performance with reduced environmental impact.

In terms of application, the metal impurities and particles segment dominates the market share, supported by its vital role in eliminating critical contaminants that affect circuit performance and yield. The organic residue segment is experiencing significant market growth as complex multilayer architectures and new slurry chemistries demand tailored cleaning agents to prevent surface contamination and corrosion. Both segments are essential to improving wafer throughput and extending equipment lifespan, highlighting their importance in modern fabrication ecosystems.

Leading companies such as Entegris, Versum Materials (Merck KGaA), Mitsubishi Chemical, Fujifilm, and DuPont hold substantial influence over the PCMP cleaning chemistry market size through their comprehensive product portfolios and continuous innovation in high-purity chemical formulations. Kanto Chemical, BASF, Solexir, and Anjimirco Shanghai are also strengthening their positions by developing customized cleaning solutions aligned with regional semiconductor manufacturing standards. These firms emphasize R&D collaboration, supply chain reliability, and advanced material compatibility, positioning themselves as key contributors to the evolving semiconductor ecosystem.

Regionally, Asia-Pacific dominates the PCMP Cleaning Chemistry Market, driven by the concentration of semiconductor fabs in China, Japan, South Korea, and Taiwan. North America follows with strong demand from advanced chip manufacturers investing in next-generation logic and memory production. Europe is expanding its presence with growing investments in microelectronics and sustainable chemical solutions. Southeast Asia and Latin America are emerging as strategic manufacturing and supply chain hubs, offering new opportunities for chemical providers. The overall market forecast indicates sustained growth, propelled by miniaturization trends, advanced wafer cleaning technologies, and the global transition toward more efficient and eco-friendly semiconductor fabrication processes.

by Type

• Acid Material
• Alkaline Material

by Application

• Metal Impurities and Particles
• Organic Residue

By Company

Entegris, Versum Materials (Merck KGaA), Mitsubishi Chemical, Fujifilm, DuPont, Kanto Chemical, BASF, Solexir, Anjimirco Shanghai

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https://reports.valuates.com/market-reports/QYRE-Auto-4C850/global-pcmp-cleaning-chemistry

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